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EMS MATERIALS SCIENCE & METROLOGY CATALOG 2019–20 EDITION TEM SUPPLIES


 Silicon Nitride TEM Window Grids Silicon Nitride TEM Window Grids perform well under harsh lab conditions.


 Silicon Dioxide TEM Window Grids


Engineered to be easier to handle. By making the grids slightly narrower users now have easy access to grids in TEM holders. No more fumbling with tweezers while trying to pick


Silicon frames are 100µm thick. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.


FEATURES


 Plasma Cleanable — can be vigorously plasma cleaned to remove organic contamination


 Field to Field Uniformity — Less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid


 Tolerates temperatures above 1000°C — Supports use in environmental TEMs where dynamic processes are observed at high temperatures


 Withstands Harsh Conditions — Provides an ideal balance of imaging resolution, chemical stability and mechanical strength


 Incorporates LPCVD, low-stress (~250MPa), non-stoichiometric silicon nitride — Provides flat, insulating and hydrophobic surfaces


RECOMMENDED USE High Resolution Imaging:


5nm Robust, Increased 10nm


High Resolution: Everyday Imaging: 20nm


Demanding Conditions:


Materials & Cryo-EM Suspension:


50nm 76042-43, 1 square (25x25µm)


76042-44, 9 squares (50x50µm) 76042-45, 2 slots (50x1500µm)* 76042-46, 9 squares (100x100µm)


76042-49, 1 square (500x500µm) 76042-50, 9 squares (100x100µm) 76042-53, 1 square (100x100µm)


76042-52, 1 square (500x500µm) 76042-51, 1 square (1000x1000µm) 76042-50, 9 squares (100x100µm)


Microporous 76042-41, 1 square (500x500µm) 76042-40, 1 square (500x500µm)


*Coated with 1 nm of ultrahigh purity carbon to minimize charging


ORDERING INFORMATION Cat. No


Window(s) (Dim.)


500µm sq. 500µm sq.


500µm sq. 25µm sq. SiN (Th)


Silicon Nitride Microporous TEM Window Grids (2.0 µm pores with labeled grid) 76042-40 76042-41


Silicon Nitride Nanoporous TEM Window Grid 76042-42


Silicon Nitride TEM Window Grids 76042-43 76042-44 76042-45 76042-46 76042-47 76042-48 76042-49 76042-50 76042-51 76042-52 76042-53


(9) 100µm sq. 1000µm sq. 500µm sq. 100µm sq.


82


(8) 50µm sq., (1) 50x100µm (2) 50x1500µm


(8) 100 sq., (1) 100x350µm (8) 250 sq., (1) 250x500µm (8) 100 sq., (1) 100x350µm 500µm sq.


20nm 50nm


20nm


5nm 5nm 5nm


10nm 10nm 20nm 20nm 50nm 50nm 50nm 50nm


Qty


10/pk 10/pk


10/pk


10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk


up or put down grids. The new TEM Window grid shape is still compatible with all standard holders. TEM Window dimensions are 2.9mm in diameter and 100µm thick.


FEATURES


 Plasma Cleanable — Can be vigorously plasma cleaned to remove organic contamination


 Field to Field Uniformity — Reduced variability


 Tolerates temperatures above 1000°C — Supports use in environ- mental TEMs where dynamic processes are observed at high tempera- tures


 Withstands Harsh Conditions — Provides an ideal balance of imaging resolution, chemical stability and mechanical strength


 Incorporates stoichiometric silicon dioxide — Offers the ability to analyze for nitrogen by EDX techniques


SPECIFICATIONS


100 micron thick frame, fits 3 mm sample holders Non-Porous films are lightly wrinkled with approximately 5 microns or less deflection across 100 microns of travel. This is typically not problematic for high-resolution imaging.


GFLAT silicon oxide films are created by a proprietary process that uniquely results in flat, suspended silicon oxide membranes. These membranes are ideally suited for biological imaging studies, with a glass-like hydrophilic surface. These TEM Windows are essentially micro-scale glass cover slips.


ORDERING INFORMATION Cat. No


Window(s)(Dim.)


Non-Porous Silicon Dioxide TEM Windows 76042-90 76042-91


(8) 100µm, (1) 100x350µm (8) 50µm, (1) 50x100µm


Non-Porous Silicon Dioxide G-FLAT Window 76042-92


1000µm sq. SiO2(Th) Qty


40nm 20nm


10/pk 10/pk


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