EMS MATERIALS SCIENCE & METROLOGY CATALOG 2019–20 EDITION EQUIPMENT & ACCESSORIES EMS 1050 Plasma Asher
The EMS 1050 consists of a solid state RF Generator and associated tuning circuits, a vacuum system with a solenoid controlled valve, a constant feed gas supply system, and a reaction chamber system which includes two semicircular electrodes and two piece pyrex chamber. The unit has one gas control as standard.
The solid state RF Generator is a solid state crystal controlled oscillator designed to provide up to 150 watts of continuous wave 13.56 MHz power to the reaction chamber. Maximum power transfer from the power supply to the reaction chamber is accomplished by matching the output impedance of the amplifier to the input impedance of the reaction chamber.
The gas supply system consists of the gas delivery system inside the reaction chamber. This delivery system is a glass tube sealed on the inner end and perforated along its bottom surface. Connections to the delivery tube are fastened with special clips to prevent the possible leakage of contaminants into the chamber.
The EMS 1050 is often used in Asbestos Specimen Preparation as a Low Temperature Ashing Technique.
FEATURES
Automatic tuning of RF power. Built-in rotary vacuum pump.
Barrel chamber with isotropic etching.
Low temperature plasma ashing, etching, and cleaning. (0-150 watts RF)
Vacuum monitoring. Dual flow gauge gas control. Accurate process timer. Needle valve vent control.
Micro controller, with default settings programmable by the operator.
Indication of settings by LCD display of status/entry.
Indication of conditions during cycle, vacu- um, power, time.
Location bay for backing pump filled with special “oil”.
Sample carrier for convenient loading.
Rack-out drawer loading door for ease of sample access.
Polycarbonate safety shield. Application Example Low temperature plasma ashing of coal...
The EMS1050 can be used to remove the organic content from coal, leaving a residue of mineral and volatile components for subsequent analysis. The advantage of low temperature RF plasma ashing over other methods, such as heating in a muffle furnace (typically at 700°C), is that many more of the volatile components are retained.
In the following experiment oxygen gas was used with a forward power setting of 100W.
196
A thermocouple was introduced into the chamber via a vacuum feed through in the rear of the EMS1050 process chamber. The thermocouple was fixed with high temperature resistant tape to the base of a glass Petri dish and covered with approximately 5g of coal granules of approximately 1-2mm3
in size, covering the thermocouple tip to a depth of 1.5mm.
After one hour it was apparent that the temperature had reached a maximum 150°C.
Product Description
Built to withstand heavy use - 24 hours a day for some plasma ashing schedules - the EMS 1050 features microprocessor control with automatic operation and offers durability and simplicity of operation. Barrel systems plasma etch or plasma ash isotropically (in all directions) and are suitable for the majority of applications.
The EMS 1050 uses a low pressure, RF-induced gaseous discharge to modify specimen surfaces or remove specimen material in a gentle, controlled way. A significant advantage over alternative methods is that the plasma etching and ashing processes are dry (no wet chemicals needed) and take place at relatively low temperatures.
A wide range of surface modification methods are available, using a variety of process gases. Using oxygen (or air) as the process gas, the molecules disassociate into chemically-active atoms and molecules and the resulting ‘combustion’ products are conveniently carried away in the gas stream by the vacuum system.
Chamber, specimen handling and gas control The EMS 1050 has a 110mm diameter x 160mm borosilicate glass chamber horizontally mounted with a slide-out specimen drawer and viewing window. Evacuation of the chamber is achieved by an optional 50L/m mechanical rotary vacuum pump. Ingress of reactive gases is controlled by two built-in flow-meters backed by solenoid valves.
NB: For applications where borosilicate glass needs to be avoided, the EMS 1050 can be fitted with a quartz chamber.
“Rack Out” Specimen Stage
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