This page contains a Flash digital edition of a book.
NEWS REVIEW


GaN power defence project reaches conclusion


A GOVERNMENT and industry team led by engineers from the Air Force Research Laboratory’s Materials and Manufacturing Directorate (AFRL/RX) have completed a GaN program.


The project focused on assessing, improving, refining, and validating a domestic source of supply for X-Band GaN Monolithic Microwave Integrated Circuits (MMICs). Because GaN semiconductors enable devices and MMICs with improved power, efficiency and bandwidth, MMIC technology offers the highest level of integration and the smallest form factor and they have become the technology of choice for power amplifiers and radars.


MMIC technology typically provides better high-frequency performance by reducing parasitic circuit elements and provides enhanced reproducibility as a result of uniform processing and integration of all circuit elements. GaN products include power amplifiers and supporting MMIC solutions, such as low-noise amplifiers, driver amplifiers and limiters. GaN power amplifier technology significantly enhances the warfighters’ capabilitie by increasing radar ranges, sensitivity, and search capabilities when compared to existing radar platforms based on other semiconductor technologies. Additional defence applications for GaN MMICs include communication systems, electronic warfare applications, imaging, and sensor systems.


The Manufacturing and Industrial Technologies Division (AFRL/RXM) Defence Production Act (DPA) Title III team is responsible for conducting this work. Title III is a Department of Defence (DoD)-wide initiative under the Deputy Assistant Secretary of Defence, Manufacturing and Industrial Base Policy (MIBP). The Air Force serves as the Executive Agent for the Title III Program within the Department of Defence and the Title III Program Office is located at Wright-Patterson AFB, Ohio, as a


highest category awarded by the DoD), and is recognized for providing trusted, national security critical components. Their foundry employs 30 researchers and 100 device, circuit and module engineers in addition to numerous production staff operating a 23,000 square foot, Class-100 clean room facility.


This Title III project achieved the primary objective of improving and maturing the production of GaN MMICs by producing a manufacturing process capable of Low Rate Initial Production (LRIP).


component of AFRL/RXM.Jeffrey Smith, an engineer from RXM, serves as Air Force Executive Agent Program Manager. “The Title III Program is a government- funded venture that aides manufacturers who specialize in materials used for defence applications,” Smith says. “Production capabilities that would otherwise be inadequate are transformed to support the material requirements of defence programs in a timely and affordable manner.”


Smith notes Title III focuses on materials and components that could be used in a broad spectrum of defence systems. He says, “The direct and indirect benefits to defence programs resulting from Title III initiatives are substantial, and Title III projects create numerous economic and technological benefits for domestic industries and consumers.”


DPA Title III engineers worked with Raytheon to execute the program at its Compound Semiconductor Foundry, located within its Integrated Air Defence Centre in Andover, Mass. Raytheon, headquartered in Waltham, Mass., possesses a broad international and domestic customer base, including the U.S. Missile Defence Agency, the U.S. Armed Forces, and the Department of Homeland Security. In addition, its IADC facility is a Department of Defence Category 1A Trusted Foundry (the


10 www.compoundsemiconductor.net January / February 2014


“The project achieved a Manufacturing Readiness Level of 8, meaning the fabrication processes are ready for LRIP for insertion into defence systems,” Gene Himes, the AFRL/RXM program manager for the initiative says. “When comparing the final results to the baseline.


Manufacturing Readiness Assessment, Raytheon exceeded all threshold yield key performance parameters resulting in a three times improvement in product yield and a 76 percent cost reduction for its GaN MMICs.”


In addition to yield improvements, the team logged more than one million hours of reliability testing over the course of the project. Comprehensive reliability testing helped to eliminate early MMIC failures and exceed the median time to failure key performance parameters by 1,000 times.Raytheon engineers also enhanced their GaN MMIC computer design model, which resulted in first pass design successes, robust models incorporating temperature and process variations, and comprehensive design kits for use in two separate software packages.


“This program exploited the material properties of GaN semiconductors to enable devices and MMICs with higher power, higher efficiency and bandwidth, and superior performance than existing semiconductor technologies,” Himes adds.


Page 1  |  Page 2  |  Page 3  |  Page 4  |  Page 5  |  Page 6  |  Page 7  |  Page 8  |  Page 9  |  Page 10  |  Page 11  |  Page 12  |  Page 13  |  Page 14  |  Page 15  |  Page 16  |  Page 17  |  Page 18  |  Page 19  |  Page 20  |  Page 21  |  Page 22  |  Page 23  |  Page 24  |  Page 25  |  Page 26  |  Page 27  |  Page 28  |  Page 29  |  Page 30  |  Page 31  |  Page 32  |  Page 33  |  Page 34  |  Page 35  |  Page 36  |  Page 37  |  Page 38  |  Page 39  |  Page 40  |  Page 41  |  Page 42  |  Page 43  |  Page 44  |  Page 45  |  Page 46  |  Page 47  |  Page 48  |  Page 49  |  Page 50  |  Page 51  |  Page 52  |  Page 53  |  Page 54  |  Page 55  |  Page 56  |  Page 57  |  Page 58  |  Page 59  |  Page 60  |  Page 61  |  Page 62  |  Page 63  |  Page 64  |  Page 65  |  Page 66  |  Page 67  |  Page 68  |  Page 69  |  Page 70  |  Page 71  |  Page 72  |  Page 73  |  Page 74  |  Page 75  |  Page 76  |  Page 77  |  Page 78  |  Page 79  |  Page 80  |  Page 81  |  Page 82  |  Page 83  |  Page 84  |  Page 85  |  Page 86  |  Page 87  |  Page 88  |  Page 89  |  Page 90  |  Page 91  |  Page 92  |  Page 93  |  Page 94  |  Page 95  |  Page 96  |  Page 97  |  Page 98  |  Page 99  |  Page 100  |  Page 101  |  Page 102  |  Page 103  |  Page 104  |  Page 105  |  Page 106  |  Page 107  |  Page 108  |  Page 109  |  Page 110  |  Page 111  |  Page 112  |  Page 113  |  Page 114  |  Page 115  |  Page 116  |  Page 117  |  Page 118  |  Page 119  |  Page 120  |  Page 121  |  Page 122  |  Page 123  |  Page 124  |  Page 125  |  Page 126  |  Page 127  |  Page 128  |  Page 129  |  Page 130  |  Page 131  |  Page 132  |  Page 133  |  Page 134  |  Page 135  |  Page 136  |  Page 137  |  Page 138  |  Page 139  |  Page 140  |  Page 141  |  Page 142  |  Page 143  |  Page 144  |  Page 145  |  Page 146  |  Page 147  |  Page 148  |  Page 149  |  Page 150  |  Page 151  |  Page 152  |  Page 153  |  Page 154  |  Page 155  |  Page 156  |  Page 157  |  Page 158  |  Page 159  |  Page 160  |  Page 161  |  Page 162  |  Page 163  |  Page 164  |  Page 165  |  Page 166  |  Page 167  |  Page 168  |  Page 169