Page 68
www.us-
tech.com
September, 2016
The Internet of Manufacturing Continued from previous page
Applying the New Language OML can be applied today in four
broad areas: as part of Industry 4.0 closed-loop feedback systems; as part of IoM “big data” systems; in the supply chain for accurate mate- rials traceability, inventory ac - cur acy, and just-in-time logis- tics; and with manufacturing execution systems (MES) for process-level compliance, trace- ability, and poka-yoke control. Closed-loop feedback sys-
layouts. The information also con- tains a complete build record of each product made, which is a combina- tion of material traceability and process traceability, and ensures cor- rect operation procedure by direct
OML supports the creation of a
true plug-and-play architecture. By adopting this specification, any new machine or process
tems, the analysis of productiv- ity and asset utilization, the creation of live just-in-time material operations based on actual material usage and spoilage can all be created using OML. Having full visibility of an operation allows the computer sys- tem to optimize the flow and alloca- tion of products to production lines and accommodate changes in cus- tomer demand, without losing pro- ductivity due to unnecessary setup changes or inefficient SMT feeder
introduced into a manufacturing operation can be integrated
immediately without having to rewrite software interfaces, algorithms and data definitions.
process interaction and control. With OML, data exchange is
bidirectional. As well as the collec- tion of process data, set-up and con- trol can be handled remotely. The built-in normalization definitions within OML are based on more than
Continued on next page
RH Measurements... Continued from page 65
AMS devices simultaneously meas- ure RH in real-time at five locations on the wafer while it is transferred in the same way as a wafer to qualify N2 and XCDA environments.
Measuring RH in Reticle Environments
When proper measures are not 7/29/16 3:14 PM Page 1
taken to control the phenomenon, 193 nm immersion scanners are adversely affected by something called “reticle haze.” There are three areas that need to be controlled in order to reduce this haze effect on reticles, one of which is controlling RH. Reticle haze is increased when
H2O is present. There are several limita-
tions with the current reticle environment RH measurement methods, for example, handheld RH sensors are inconvenient and can compromise the reticle envi- ronment. In addition, many areas are inaccessible to handheld RH sensors, in-situ RH sensors or benchtop type RH sensors. The importance of particle,
AC-DC Converters Power Factor Corrected
Two Units in One! AC1 Series — Universal AC Input 46-400Hz Input Frequency
• ALL in ONE compact brick module, 2.5” x 4.6” x 0.8” Vacuum encapsulated for rugged environments • Standard: 5 to 300 Vdc Regulated, ISOLATED outputs/Fixed frequency • Lower cost for your industrial applications • Maximize your design up to 300 watt models • Meets Harmonic Distortion specifications • .99 Power factor rating at operational levels
Custom Models Available! DC-DC CONVERTERS
www.picoelectronics.com 143 Sparks Ave., Pelham, New York 10803
See PICO’s full line catalog at PICOELECTRONICS, Inc.
Call Toll Free 800-431-1064 • FAX 914-738-8225 E Mail:
info@picoelectronics.com
leveling, vibration, and RH control has rarely been overlooked in the reticle environment. However, the need to maximize both yields and tool uptimes in reticle mask envi- ronments requires best-in-class practices. Whether for diagnostics, qualifi-
cation or preventive maintenance, equipment engineers need to effi- ciently and effectively make measure- ments and adjustments to the tools. Legacy particle, vibration, leveling and RH measurement methods are typically cumbersome, non-represen- tative, not real-time, compromise the production environment, are costly, and require time to take the tool offline for these tasks. By contrast, best practice meth-
ods involve collecting and displaying data in real-time, speeding equip- ment alignment or setup. Real-time data also speeds equipment diagnos- tic processes, saving valuable time and resources. Equipment engineers can also make the right adjustments consistently by using objective and
reproducible data that enhances process uniformity. The ReticleSense® AMSR from CyberOptics is an actual glass reticle
that measures H2O in the reticle environment and is compatible with ASML, Canon and Nikon scanners. AMSR travels throughout the entire reticle environment and measures RH. It helps to locate the sources of
the H2O, resulting in increased reti- cle lifetime. Two additional measure- ment capabilities of the device include measuring x, y and z vibra- tion and inclination. The AMSR travels the entire
path of the reticle and can measure humidity in all locations. In immer-
ReticleSense glass reticle RH sensor.
and XCDA reticle mask environ- ments, the use of a real-time meas- urement device, the AMS, delivers on three compelling bottom lines for the fab — saving both time and expense and improving yields. Contact: CyberOptics Corp.,
sion scanner environments, monitor- ing humidity is critical to reducing reticle haze. Equipment qualifica- tions can be done faster as the same device also measures vibration and leveling. Controlling inclination, RH and vibration are all important fac- tors in increasing yield and reducing downtime. For RH measurements in N2
5900 Golden Hills Drive, Minneapolis, MN 55416 % 763-542-5000 fax: 763-542-5100 E-mail:
info@cyberoptics.com Web:
www.cyberoptics.com r
WATTS
UP TO 300
Page 1 |
Page 2 |
Page 3 |
Page 4 |
Page 5 |
Page 6 |
Page 7 |
Page 8 |
Page 9 |
Page 10 |
Page 11 |
Page 12 |
Page 13 |
Page 14 |
Page 15 |
Page 16 |
Page 17 |
Page 18 |
Page 19 |
Page 20 |
Page 21 |
Page 22 |
Page 23 |
Page 24 |
Page 25 |
Page 26 |
Page 27 |
Page 28 |
Page 29 |
Page 30 |
Page 31 |
Page 32 |
Page 33 |
Page 34 |
Page 35 |
Page 36 |
Page 37 |
Page 38 |
Page 39 |
Page 40 |
Page 41 |
Page 42 |
Page 43 |
Page 44 |
Page 45 |
Page 46 |
Page 47 |
Page 48 |
Page 49 |
Page 50 |
Page 51 |
Page 52 |
Page 53 |
Page 54 |
Page 55 |
Page 56 |
Page 57 |
Page 58 |
Page 59 |
Page 60 |
Page 61 |
Page 62 |
Page 63 |
Page 64 |
Page 65 |
Page 66 |
Page 67 |
Page 68 |
Page 69 |
Page 70 |
Page 71 |
Page 72 |
Page 73 |
Page 74 |
Page 75 |
Page 76 |
Page 77 |
Page 78 |
Page 79 |
Page 80 |
Page 81 |
Page 82 |
Page 83 |
Page 84 |
Page 85 |
Page 86 |
Page 87 |
Page 88 |
Page 89 |
Page 90 |
Page 91 |
Page 92 |
Page 93 |
Page 94 |
Page 95 |
Page 96 |
Page 97 |
Page 98 |
Page 99 |
Page 100 |
Page 101 |
Page 102 |
Page 103 |
Page 104 |
Page 105 |
Page 106 |
Page 107 |
Page 108 |
Page 109 |
Page 110 |
Page 111 |
Page 112 |
Page 113 |
Page 114 |
Page 115 |
Page 116