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Equipment and Materials ♦ news digest


Oxford announces more plasma etch deposition & growth seminars


The firm will present in conjunction with leading research organisations in the U.K., U.S.A. and France.


The 2651A current sourcing and measurement is 1pA to 50A (100A with two units). It can test a wider range of power semiconductors and other devices than previous models and has two measurement modes in a single high power/high current instrument.


Oxford Instruments is continuing its series of seminars and workshops once again this summer and autumn. Co-hosted with leading research organisations worldwide, the events include:


30th June 2011: A one day event at the prestigious University of Southampton, UK where a number of speakers will conduct presentations on ALD, Ion Beam, Plasma Sources and many other aspects of Etch, Deposition and Growth Technologies.


14 July 2011: ‘New frontiers in plasma nanopatterning’ at LBNL, USA, where a workshop event will be held for the 3rd consecutive year.


18 October 2011: ‘Nanoscale plasma processing’ at CEA-LETI, Grenoble, France


It also has dual A/D converters for each measurement mode and enables full simultaneous characterisation and measurement of both current and voltage waveforms. The Keithley 2651A is fully isolated and has independent channels with 500nSec synchronisation and provides easier, faster, and more flexible connection and grounding schemes that enable true SMU-per-pin testing in multi-channel applications.


These seminars are all free of charge, but must be booked in advance as places are limited.


Schedule of Seminars


30 June 2011: Knowledge creation partnership - from funding to results


Hosted by the University of Southampton, UK & Oxford Instruments


This seminar shares experiences in successful collaborations between industry and the scientific research community. It also presents technical


October 2011 www.compoundsemiconductor.net 195


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