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700-1000 MHz GaAs pHEMT low-noise amplifier: 0.5dB noise figure; 38.8dB OIP3; 21dBm P1dB RF output power; single positive supply (4.35V at 57mA).


TQP3M9040 Oder.


FBH is one of the leading institutes in developing III-V semiconductors, while IHP is specialised in silicon-based systems and circuits. Both Leibniz institutes joined forces within the HiTeK project to combine the advantages of silicon-based CMOS (Complementary Metal Oxide Semiconductor) circuits from the IHP with those of InP circuits from the FBH.


1500-2300 GHz GaAs pHEMT low-noise amplifier: 0.62dB noise figure; 39.8dB OIP3, 21dBm P1dB RF output power; single positive supply (4.4V at 57mA).


Both devices come in a dual-amplifier structure which enables balanced operation. They provide adjustable bias (drain current and voltage) and integrated bias shut-down capability for FDD and TDD operation. Both come in a 4 x 4mm QFN package.


The TQP3M9039 and TQP3M9040 are in full production and samples are available.


InP-Si sandwich chips combine the best of both worlds


The integration of an indium phosphide chip with a silicon chip could be the key to faster and more powerful terahertz devices for high resolution and mobile applications


Two Leibniz institutes have broken new technological ground; they have successfully combined their up to now, separate technologies.


Due to their high performance, the novel chips developed within the HiTeK project promise to open the door to new applications.


Wolfgang Heinrich and Bernd Tillack are convinced of holding the key to faster and more powerful terahertz (THz) chips. The two scientists and their teams come from the Berlin-based Ferdinand- Braun-Institut (FBH) and from the IHP-Leibniz- Institut für innovative Mikroelektronik in Frankfurt/


The partners have taken an important step within the project by successfully integrating both circuits onto a semiconductor wafer, with experimental results demonstrating their high performance.


With the integration on one chip, new ambitious applications in the THz range are within reach. These include high-resolution imaging systems for medical and security technology as well as ultra- broadband mobile communication applications.


InP / Silicon sandwich wafer


For such applications, high output powers along with faster computer processors are needed, offering enhanced computer operation per second. In order to achieve this, circuits on the chips need to become smaller to boost miniaturisation in the semiconductor industry.


If the frequency range around 100 gigahertz (GHz) and beyond is to be covered, however, the breakdown voltage in the CMOS switching circuits decreases significantly. As a consequence, the available output power of the chips declines. This implies that the capability of generating sufficiently strong signals to establish a radio link and to detect material defects becomes insufficient.


To find a solution to this problem, IHP conducted research on bipolar CMOS based on SiGe, enhancing the breakdown voltages at high speed


January/February 2013 www.compoundsemiconductor.net 129


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