news digest ♦ RF Electronics
N-doped ZnO films of (a) n type sample 130A before (solid lines) and 130B after (dashed lines) an 800 C, 60s ex situ
anneal in N2 and (b) p-type sample 131C before (solid lines) and 131D after (dashed lines) a 30s ex situ anneal in N2
RGB lasers for pico- projectors use a novel wavefront measurement Pico-projectors are an emerging technology that
integrates image projectors in a handheld device, offering numerous benefits for consumers. These include portability, space saving, flexible projection screen and setup time
Pico-projectors can be used as stand-alone or embedded projectors in mobile devices, for example in smartphones, tablets, digital cameras.
The market of pico-projectors is rising rapidly with already a million units a year sold as cost price decreases with volume, and is expected to continue growing as new applications appear every day.
The three major pico-projector technologies DLP (Digital Light processing), LCoS (Liquid Crystal on Silicon) and LBS (Laser-Beam-Steering), bring specific advantages and drawbacks for image quality, consumption, size or cost.
11.6K PL spectra of (a) 131C, 131E, and 144G, 144I before and (b) after the ex situ 8000C O2 anneal
This research illustrates how to create p-type materials from ZnO, but the defect complex allows the ZnO p-n junction to function efficiently and produce UV light at room temperature.
More details of this work are published in the paper, “Shallow acceptor complexes in p-type ZnO,” by Judith Reynolds et al in Applied Physics Letters, 102, 152114 published online on 19th April
2013.http://
dx.doi. org/10.1063/1.4802753
This research was supported by the Defence Advanced Research Projects Agency.
Among the main components integrated in these very small devices (battery, microcontroller, MEMS micro mirrors, projection lens), the optical RBG source block is a key component that determines the resulting image projection quality.
Each colour LD combined with collimation lens must be precisely adjusted in XYZƟ to provide same optical axis and focus conditions. Due to the low beam divergence and tight adjustment tolerances, the alignment of the light source is a complex and tedious task.
The beam waste position of the near collimated beam must be precisely adjusted within +/- 10mm range and tilt deviation may initially exceed 20 degrees.
Beyond the measurement performance, the manufacturing process dictates a limited space for the measurement device and a close position to the RGB source block.
What›s more, the cost of the quality control system must be in accordance with the expected return on
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www.compoundsemiconductor.net June 2013
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