EQUIPMENT & ACCESSORIES CATALOG EDITION IV LARGE CHAMBER SPUTTER COATERS zzzQ300T D Plus (continued)
Rotation stage – 50 mm Ø. This stage only rotates and has no tilt or height adjustment.
Rotate-tilt stage – 50 mm Ø. With height adjustment (target to stage height variable between 30-80 mm). The tilt angle can be pre-set (horizontal to 30°).
Rotation stage for glass slides – 25 mm x 76 mm Safety
The Q300T D Plus meets key industry CE standards • All electronic components are protected by covers • Implosion guard prevents user injury in event of chamber failure
• Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
• Overheating protection shuts down power supply Vacuum control
High vacuum turbo pumping allows sputtering of a wide range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications. Automatic vacuum control which can be pre-programmed to suit the process and material, therefore removing the need for manual intervention or control.
Cool magnetron sputtering
Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for some applications because it can heat the substrate and result in damage when the plasma interacts with the substrate. The Q300T D Plus uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your substrate is protected and uniformly coated.
The Q300T D Plus uses easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidizing and noble metals. It is fitted with gold (Au) and chromium (Cr) sputter targets as standard.
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New user interface has been thoroughly updated:
z Dual-core ARM processor for a fast, responsive display z Capacitive touch screen is more sensitive for ease of use
z User interface software has been extensively revised, using a modern smartphone-style interface
z Comprehensive context-sensitive help
z USB interface allows easy software updates and backing up/copying of recipe files to USB stick
z Process log files can be exported via USB port in .csv format for analysis in Excel or similar. Log files include date, time and process parameters.
z 16GB of flash memory can store more than 1000 recipes
z Quick and easy creation of process sequences with a simple copy, drag and drop operation
Allows multiple users to input and store coating recipes. New feature to sort recipes per user according to recent use.
System prompts user to confirm target material and it then automatically selects appropriate parameters for that material
Dual sputtering heads and automatic shutter
Rotary planetary stage and dual- channel film thickness monitor - both Q300T D Plus option
Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. For convenience a number of typical sputtering and carbon coating profiles are already stored but also allows the user to create their own.
Software detects failure to achieve vacuum in a set period of time and shuts down the process in case of vacuum leak, which ensures pump protection from overheating.
Standard rotating specimen stage with 4 wafer and optional dual- channel film thickness monitor
Optional specimen stage for glass microscope slides and dual- channel film thickness monitor
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