EQUIPMENT & ACCESSORIES CATALOG EDITION IV LARGE CHAMBER SPUTTER COATERS
Terms and Techniques Magnetron Sputtering
Magnetron sputtering using a crossed-field electromagnetic configuration keeps the ejected secondary electrons near the cathode (target) surface and in a closed path on the surface. This allows a dense plasma to be established near the sputter target surface. The ions that are accelerated from the plasma do not sustain energy loss by collision before they bombard the sputter target.
For electron microscopy (EM) specimen coating, the magnetron sputtering head design ensures that minimal heat energy (electrons) reach the specimen surface. This is important as it reduces heat damage to specimen and is a significant factor in ensuring the grain size within the sputtered film is optimally small essential for high resolution field emission scanning electron microscopy (FE-SEM).
Film Thickness Monitor (FTM)
A film thickness monitor can be used to monitor and control the thickness of sputtered and evaporated metal films. A gold-coated quartz crystal is mounted in the vacuum chamber of the coating system, ideally close to the specimen or substrate. The quartz crystal is made to oscillate at a defined frequency, using an externally-mounted oscillator. As metal is deposited on the quartz crystal, the frequency of oscillation alters and the change is converted to a digital (eg LED) display on the monitoring unit.
Film thickness monitors are available for use with most of our coating systems and cryo preparation systems.
Turbomolecular Pump
A turbomolecular (turbo) pump is a type of vacuum pump used to obtain and maintain high vacuum. The principle of operation is that gas molecules within a vacuum chamber can be given momentum in a desired direction by repeated collisions with a rapidly spinning turbine rotor. The rotor hits gas molecules from the inlet of the pump towards the exhaust in order to create or maintain a vacuum. A turbo pump normally works in tandem with a low-vacuum pump, such as a rotary vacuum pump, which is used to rough pump the vacuum system (eg sputter coater or vacuum evaporator) during initial pump-down period, and to back the turbo pump (ie remove gases from the back of the pump) during high-vacuum operation.
Iridium Sputter Coating
Sputtering with iridium (Ir) is increasingly popular for high resolution sputter coating of field emission scanning electron microscopy (FE-SEM) specimens, because iridium will produce films with very small grain structure and it is a non-oxidising metal. It is increasingly preferred to chromium (Cr) as a coating material for FE-SEM. Iridium-coated specimens can be stored at atmospheric pressure, compared to chromium - which readily oxidises on contact with air.
Weight
Packed dimensions Work chamber
User interface Sputter target
Pumping Rotary pump Typical ultimate vacuum Specimen stage zzzQ300T ES (continued)
Options and Accessories Specimen stages and holders
The Q300T ES has additional specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage). Rotation speeds are variable between preset limits.
• Rotation stage for 4" wafers (supplied with system) • Rotation stage for 6" wafers
• Flat rotation stage for SEM specimen stubs • Rotation stage with preset tilt for SEM specimen stubs • Rotate-tilt (rotary-planetary style) stage • Rotation stage for glass microscope slides
• Eight-place stage for 25 mm or 30 mm embedded polished specimens • “Sun and planets” style rotary stage; Three platforms, each 92 mm Ø • Microscope coverslip stage for nine 20 mm x 20 mm coverslips • TEM grid holder
Other options
• Extended height chamber (supplied with the Q300T ES) • Standard height chamber • Film thickness monitor (FTM) • Conductance film monitor (CFM)
SPECIFICATIONS Dimensions
585 mm W x 470 mm D x 410 mm H, total height with coating head open is 710 mm 37 kg
725 mm W x 660 mm D x 680 mm H (45 kg)
Borosilicate glass 283 mm ID x 215 mm H
Intuitive full graphical interface with touch-screen menus and buttons
Disc-style 57 mm Ø with thickness depending upon the target fitted. One 0.3 mm thick chromium (Cr) target (3417) is fitted as standard
Internally-mounted 70 L/s turbomolecular pump 5m3
hr two-stage rotary pump with oil mist filter. (Order separately: see 91003). Dry pumping option available. 5 x 10-5
mbar in a clean system after pre-pumping with dry nitrogen gas. Measurement using a full range Penning gauge
Stage for 4" wafer supplied as standard. For alternative stages, see Ordering Information
Services and other Information Gases
Electrical supply
Argon sputtering process gas, 99.999%. Nitrogen venting gas (optional)
90-250 V 50/60 Hz 1,400 VA including rotary pump, 110/240 V voltage selectable
42
Page 1 |
Page 2 |
Page 3 |
Page 4 |
Page 5 |
Page 6 |
Page 7 |
Page 8 |
Page 9 |
Page 10 |
Page 11 |
Page 12 |
Page 13 |
Page 14 |
Page 15 |
Page 16 |
Page 17 |
Page 18 |
Page 19 |
Page 20 |
Page 21 |
Page 22 |
Page 23 |
Page 24 |
Page 25 |
Page 26 |
Page 27 |
Page 28 |
Page 29 |
Page 30 |
Page 31 |
Page 32 |
Page 33 |
Page 34 |
Page 35 |
Page 36 |
Page 37 |
Page 38 |
Page 39 |
Page 40 |
Page 41 |
Page 42 |
Page 43 |
Page 44 |
Page 45 |
Page 46 |
Page 47 |
Page 48 |
Page 49 |
Page 50 |
Page 51 |
Page 52 |
Page 53 |
Page 54 |
Page 55 |
Page 56 |
Page 57 |
Page 58 |
Page 59 |
Page 60 |
Page 61 |
Page 62 |
Page 63 |
Page 64 |
Page 65 |
Page 66 |
Page 67 |
Page 68 |
Page 69 |
Page 70 |
Page 71 |
Page 72 |
Page 73 |
Page 74 |
Page 75 |
Page 76
