EQUIPMENT & ACCESSORIES CATALOG EDITION IV LARGE CHAMBER SPUTTER COATERS
What is... Carbon Evaporation?
The use of Carbon Evaporation is well known in Electron Microscopy for support films and replicas in TEM, and X-Ray Microanalysis and conducting coatings in SEM.
The films are continuous for thicknesses of 2nm (or 20 Angstroms) or more, and free of significant structure.
The most common form of deposition is from resistance heated carbon, or graphite rods, spectrographically pure. The rods are shaped to achieve a high current density at the point of contact of the rods with sufficient temperature being generated to cause the evaporation. At this point, the appearance being that of small, bright, glowing particles of carbon. To achieve the required vacuum condition of 1x 10-4 or better, requires the use of Diffusion or
zzzQ300T ES Large Chamber Turbo-Pumped Evaporator/Sputter Coater
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OVERVIEW The Q300T ES is a large chamber, turbomolecular- pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The Q300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.
KEY FEATURES
z Metal evaporation, carbon evaporation and metal sputtering – in one space saving design
z Larger area metal evaporation – up to 6"/152 mm z Larger area sputter/carbon coating – up to 4"/102 mm diameter
z High vacuum sputtering – oxidizing and non-oxidizing (noble) metals: suitable for SEM, high resolution FE-SEM and many thin film applications
z High vacuum carbon coater – ideal for SEM and TEM carbon coating DNA strands
z Controlled, ramped carbon rod evaporation – precise control of carbon thickness. Non- sparking process gives superior quality films
z Up to 60 minutes sputtering time – thick films capabilities z Three-Year Warranty
PRODUCT DESCRIPTION
The Q300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The Q300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.
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The sputter coating insert will deposit both oxidizing metals, e.g. chromium and Aluminum and non- oxidizing (noble) metals such as gold and platinum. A chromium (Cr) target is fitted as standard.
The Q300T ES has a full range of optional accessories, including specimen stages and film thickness measurement which means the system can be tailored to the precise requirements of the user.
Thermal evaporation of metals
The Q300T ES allows controlled thermal evaporation of metals onto large substrates (up to 6"/152 mm). For many evaporative processes, tungsten filaments supplied with the system are used. However, some metals require the use of a molybdenum boat, which can also be used for heat-cleaning SEM and TEM apertures.
Spectrin molecules
The evaporation head is normally positioned for downwards evaporation, but for small specimens upward evaporation is possible using two terminal extensions supplied with the system.
40 Thermal evaporation insert
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