EQUIPMENT & ACCESSORIES CATALOG EDITION IV SPUTTER COATERS, SEM/TEM CARBON COATERS
zzzQ150V Plus Automatic Coater (continued) Cool magnetron sputtering
Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it will heat the sample and can result in damage when the plasma interacts with the sample. The Q150V Plus series uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.
The Q150V S Plus and Q150V ES Plus use easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidizing and noble metals. The Q150V S Plus and Q150V ES Plus are fitted as standard with a chromium (Cr) sputter target. Other targets options include: Au, Au/Pd, Pt/Pd, Pd, Pt, Cu, Ir, W, ITO and Al. Others are available on request.
Pulsed cleaning for Al sputtering
Aluminum (Al) rapidly forms an oxide layer, which can be difficult to remove, but the ES & S Plus have special recipes for aluminum that reduce the oxide removal time and prevent excessive pre-sputtering of the target.
Interchangeable plug-in heads
This allows the user to configure the system as a sputter coater, evaporator or glow discharge system - all in one space saving format. A carbon cord evaporation insert is available as an option. Automatic detection of the head type when changed.
Detachable chamber with built-in implosion guard
Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process.
Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples.
Tall chamber option is available for carbon evaporation to avoid sample heating, to improve uniformity for sputtering and to hold taller samples.
Multiple stage options
The Q150V Plus has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage).
Some examples:
• Rotation stage (supplied as standard): 50 mm Ø can accommodate six standard stubs. Height can be pre-set.
• Rotate-tilt stage for improved uniform coating: 50 mm Ø. Tilt and height can be pre-set.
• Variable angle, rotary planetary stage for heavily contoured samples. • Large flat rotation stage with offset gear box for 4”/100 mm wafers. • Rotation stage for glass microscope slides. Other options are available on request. Safety
The Q150V Plus meets key industry CE standards • All electronic components are protected by covers
• Implosion guard prevents user injury in event of chamber failure
• Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
• Electrical interlocks remove power when source head cover opened • Overheating protection shuts down power supply
Wafer stage Rotacota planetary stage 29 Microscope slide stage Rotation stage
Microsporangium, spore size 150nm, coated with 3nm of Au x 70k magnification
Single electrospinning fiber tear coated with 1nm Au x 90k magnification
Page 1 |
Page 2 |
Page 3 |
Page 4 |
Page 5 |
Page 6 |
Page 7 |
Page 8 |
Page 9 |
Page 10 |
Page 11 |
Page 12 |
Page 13 |
Page 14 |
Page 15 |
Page 16 |
Page 17 |
Page 18 |
Page 19 |
Page 20 |
Page 21 |
Page 22 |
Page 23 |
Page 24 |
Page 25 |
Page 26 |
Page 27 |
Page 28 |
Page 29 |
Page 30 |
Page 31 |
Page 32 |
Page 33 |
Page 34 |
Page 35 |
Page 36 |
Page 37 |
Page 38 |
Page 39 |
Page 40 |
Page 41 |
Page 42 |
Page 43 |
Page 44 |
Page 45 |
Page 46 |
Page 47 |
Page 48 |
Page 49 |
Page 50 |
Page 51 |
Page 52 |
Page 53 |
Page 54 |
Page 55 |
Page 56 |
Page 57 |
Page 58 |
Page 59 |
Page 60 |
Page 61 |
Page 62 |
Page 63 |
Page 64 |
Page 65 |
Page 66 |
Page 67 |
Page 68 |
Page 69 |
Page 70 |
Page 71 |
Page 72 |
Page 73 |
Page 74 |
Page 75 |
Page 76
