EQUIPMENT & ACCESSORIES CATALOG EDITION IV LARGE CHAMBER SPUTTER COATERS zzzQ300T T Plus (continued)
New user interface has been thoroughly updated:
Q300T T Plus has a 200 mm wafer capability
Safety The Q300T T Plus meets key industry CE standards • All electronic components are protected by covers • Implosion guard prevents user injury in event of chamber failure
• Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
• Overheating protection shuts down power supply Vacuum control
High vacuum turbo pumping allows sputtering of a wide range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications. Automatic vacuum control which can be pre-programmed to suit the process and material, therefore removing the need for manual intervention or control.
Cool magnetron sputtering
Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it can heat the sample and result in damage when the plasma interacts with the sample. The Q300T T Plus uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.
The Q300T T Plus uses easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidizing and noble metals. The Q300T T Plus is fitted as standard with a chromium (Cr) sputter target. Other targets options include; Au, Au/Pd, Pt/Pd, Pd, Pt, Cu, Ir, W, ITO and Al, etc.
Pulsed cleaning for aluminum sputtering
Aluminum (Al) rapidly forms an oxide layer which can be difficult to remove. The Q300T T Plus has a special recipe for Aluminum that reduces the oxide removal time and prevents excessive pre-sputtering of the target.
Film thickness monitor
The Q300T T Plus can be fitted with an optional film thickness monitor (FTM), which measures the coating thickness on a quartz crystal monitor within the chamber, in order to control the coating thickness of material deposited on to the sample.
Film thickness monitor option
z Dual-core ARM processor for a fast, responsive display z Capacitive touch screen is more sensitive for ease of use
z User interface software has been extensively revised, using a modern smartphone-style interface
z Comprehensive context-sensitive help
z USB interface allows easy software updates and backing up/copying of recipe files to USB stick
z Process log files can be exported via USB port in .csv format for analysis in Excel or similar. Log files include date, time and process parameters.
z 16GB of flash memory can store more than 1000 recipes
z Quick and easy creation of process sequences with a simple copy, drag and drop operation
Allows multiple users to input and store coating recipes. New feature to sort recipes per user according to recent use.
System prompts user to confirm target material and it then automatically selects appropriate parameters for that material
Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. For convenience a number of typical sputtering and carbon coating profiles are already stored but also allows the user to create their own.
Software detects failure to achieve vacuum in a set period of time and shuts down the process in case of vacuum leak, which ensures pump protection from overheating.
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