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“Working closely with our customers to develop practical solutions is central to everything we do at Fairchild,” Tan added. “We are proud of the work our China GPRC team has done to bring this innovative, and energy-efficient, LED lighting solution to our customers. Fairchild’s latest IC technologies and system expertise, along with our ongoing support, will enable our customers to quickly deploy this new solution, bring new LED lighting products to market and provide a competitive advantage in the market place.”


Fairchild’s Global Power Resource Centers are a valuable resource for system design engineers, enabling them to quickly differentiate their designs and shorten time-to-market. The centers were established to deliver innovative, efficient power management and mobile solutions targeting a wide range of applications both locally and around the world. This solution was developed at one of Fairchild’s GPRC locations in China. The company has other centers in the United States, Germany, South Korea and Brazil.


Stanford University places order for 2 CVD Systems with Plasma-Therm


The Versaline and Shuttlelock systems will give researchers at the Nanofabrication Facility the tools necessary to make advances in nanoscience applications.


StanfordUniversityhas recently placed an order for two Plasma-Therm deposition systems: a Versaline HDPCVD system and a Shuttlelock PECVD system. The tools will be installed at Stanford’s Nanofabrication F acility.


Plasma-Therm’s Versaline system, with its high density ICP plasma and temperature controlled environment, expands research capabilities by providing critical technology to deposit high quality dielectric films at low temperatures.


The Suttlelock PECVD system uses a more traditional configuration of parallel plate electrodes that contributes fundamental and important deposition processes such as controllable low stress silicon nitride. Together, the systems will be used to assist in the Nanofabrication Facility’s research efforts in areas such as nanoelectronic


84 www.compoundsemiconductor.net August/September 2010 devices, MEMS/NEMS and photonics.


“Stanford University has long since established itself as a leading R&D facility. The deposition processes from industry proven systems like Versaline and Shuttlelock will give researchers at the Nanofabrication Facility the tools necessary to make advances in nanoscience applications,” commented Ed Ostan, Plasma-Therm’s EVP of sales & marketing.


“Plasma-Therm’s worldwide presence at nanofabrication facilities with processing equipment that spans decades is a reflection of equipment durability, reliability and technological relevance. Our continuous involvement and collaboration with these advanced laboratories is what stimulates process and equipment development”, he added.


The Stanford Nanofabrication Facility (SNF) serves academic, industrial and governmental researchers across the U.S. in areas ranging from optics, MEMS, biology, and chemistry, to traditional electronics device fabrication and process characterization.


The SNF is a 10,000 sq.ft. class 100 cleanroom facility that provides researchers with effective and efficient access to advanced nanofabrication equipment and expertise. The SNF is one of 14 universities that make up the NSF’s National Nanotechnology Infrastructure Network (NNIN). NNIN is committed to providing nanofabrication resources to researchers across the country in both industry and academia.


Plasma-Therm, founded in 1974, is a supplier of advanced plasma process equipment offers etch and deposition technologies. Plasma-Therm systems support various specialty markets including solid state lighting and compound semiconductor.


The urgency for the world to make power grids digital (smart grids) and photovoltaic developments for electricity production from solar.


Jan-Gustav Werthen, Senior Director, JDSU will be presenting “The urgency for the world to make power grids digital (smart grids) and photovoltaic developments for electricity production from solar.”


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