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Technologies, Strasbaugh. “Our customers will benefit from E-Dot’s strong IC-CMP experience, as well as their technical and process capabilities for other polishing, grinding, and lapping applications, such as TSV, LED, MEMS, prime wafer, and solar cells.”
“Partnering with Strasbaugh will enable E-Dot Technology to expand its customer and service base to better support Taiwan’s growing device and wafer manufacturing community,” says Allen Lee, the Founder, President and CEO of E-Dot Technology.
Strasbaugh has over 60 years of experience and designs and manufactures advanced surfacing systems for the LED, telecommunications and optics industries.
E-DOT Technology provides support services for foundries and manufacturing companies in Taiwan and Mainland China, and also works with suppliers who do not have support services of their own in the local area. It focuses on CMP technologies.
WEP Installs ECV Profiler at Aixtron R&D Lab
The Electrochemical Capacitance Voltage (ECV) profiler is fully automated ensuring reproducible measurement results with high accuracy.
WEP is installing its Wafer ECV-Profiler CVP21 at the Application Laboratory of Aixtron in Aachen in the second quarter of 2010.
The CVP21 is a fully automated tool for carrier concentration profiling, and uses Electrochemical Capacitance Voltage (ECV) measurements.
During my past experience in a III-V fab, the ECV tolerances were plus or minus 30%; this applied to both n-type and p-type dopants and included zinc doped indium phosphide (InP) and carbon (C) and silicon (Si) doped gallium arsenide (GaAs). The repeatability and reproducibility were highly dependent on operator and the specific equipment used when performing the measurement including the cell and the main unit.
This new system uses a fully automated measurement process and incorporates fluid handling, electrochemical cell movement, in-
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situ imaging and automated CV scan analysis to produce reproducible measurement results with high accuracy. It contains a patented process for the processing of (Al,In)GaN samples in full- automation mode and should eliminate some of the variables which affect measurement variability .
Aixtron’s Metal Organic Chemical Vapor Deposition (MOCVD) systems are used by a diverse range of customers worldwide to build advanced components for electronic and optoelectronic applications including those based on compound semiconductors.
Such components are used in display technology, signal and lighting technology, fiber communication networks, wireless and cell telephony applications, optical and electronic data storage, computer technology as well as a wide range of other high- tech applications.
The CVP21 will be installed at the R&D application lab of Aixtron where several deposition systems are operated for test and development.
“WEP welcomes the positive feedback of a market leader such as Aixtron AG”, said Thomas Wolff, President of WEP. “The CVP21 is an advanced equipment to monitor the quality of semiconductor layers and includes comprehensive self-calibration
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