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in developing best-in-class products. Oclaro supplies a wide range of its high end optical components and modules to Huawei in line with the company’s best practices and global ISO9000:2000 registration.
Quadrupole mass spectrometers introduced by Hiden Analytical
Quadrupole Mass Spectrometers for UHV/XHV Studies
Hiden Analytical introduce a family of quadrupole mass spectrometers designed specifically for UHV/XHV performance, evolved from the Hiden 3F-series concept and incorporating the proven triple-stage mass filter technology for optimum mass separation, ion transmission efficiency and contamination resistance.
Pulse ion counting detection is common throughout this series for highest sensitivity and fastest response times, with choice of positive- ion-only or combined positive and negative ion detection.
Quadrupole mean energy scanning is featured for systems configured for analysis of externally generated ions, enabling ion energy distribution measurement and optimisation for neutrals analysis.
All systems feature the Windows-MASsoft Pro multi-mode control program with multi- parameter scanning for optimisation of operating parameters for each individual mass channel. Ion detection is by fast pulse counting with continuous 7-decade scaling from 1c/s to 10E+7c/s. Sampling rates exceed 500 measurements per second, with partial pressure detection down to 5x10E-15 mbar and trace level detection to 5ppb.
A choice of ionisation sources enables system optimisation for varied applications including molecular beam, laser ablation, thermal
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desorption and general neutrals studies. All ion source parameters are software controlled with modes for ion attachment, ‘soft’ ionisation and appearance potential measurement.
Oxford Instruments Plasma Technology will hold another seminar.
Oxford Instruments Plasma Technology will hold another in its series of succesful seminars in Glasgow on 30th June 2010. The seminar’s wide programmes will include talks by Oxford Instruments Plasma Technology (OIPT) applications & development scientists, in addition to key guest speakers, and Speakers from the University of Glasgow.
Nanoscale Plasma Processing Workshop Wednesday 30th June 2010
Presented by: Glasgow James Watt Nanofabrication Centre & Oxford Instruments Plasma Technology Venue: University of Glasgow Timing: 9.30am – 4.30pm
Presentations, Discussions, Laboratory Tour and a networking lunch
This one day seminar will focus on latest innovations in Atomic Layer Deposition, Silicon and III-V Etch.
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