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Equipment and Materials ♦ news digest


Hiden Analytical celebrates 30 year anniversary


The manufacturer of instruments used in the compound semiconductor industry has gradually expanded ; it now has representations through Europe, Asia and through North and South America


In 1982 Hiden Analytical, then a new start-up company in England, commenced manufacture of quadrupole mass spectrometers for the vacuum processing element of the semiconductor fabrication industry.


with instrumentation for gas analysis through the pressure range from30 bar to ultrahigh vacuum, for catalyst characterisation, for plasma diagnostics, for SIMS measurement, for sorption science.


The needs of the R and D user continue to be a significant element of the overall business philosophy, with a dedicated product support team committed to providing custom- engineered system integration solutions and ongoing technical support.


Request your Free 30 Year Anniversary Edition Hiden Wall Planner and Desk Calendar now via the ‘Contact Us’ button on the homepage of our website. Desk Calendars are available in UK, USA, French, Italian and International formats.


Using the SEM to measure crystal structures


Application areas expanded as new products developed, initially to include general gas analysis followed by later innovations introduced to address the specific area of direct external ion measurement for plasma process diagnostics and for secondary ion monitoring (the SIMS technique).


1992 saw Hiden enter the field of microgravimetric gas sorption measurement in collaboration with the University of Birmingham, and dedicated sister-company Hiden Isochema was established to address this specific product area. A USA company was formed in 1996 to provide the US sales and service function for the full Hiden product range, with offices currently established in Michigan, New Hampshire and in California.


Now, in 2012, representation extends through Europe, Asia and through North and South America. The product range is extensive,


A new procedure to measure SEM samples greatly improves its ability to measure the crystal structure of nanoparticles and extremely thin films including indium gallium nitride


By altering sample position of materials in a scanning electron microscope (SEM), two scientists at NIST have been able to determine crystal structure of particles as small 10 nanometres (nm).


The technique, they say, should be applicable to a wide range of work, from crime scene forensics to environmental monitoring to process control in nanomanufacturing.


The technique is a new way of performing electron diffraction with an SEM. In standard SEM-based electron diffraction, the researcher analyses patterns that are formed by electrons that bounce back after striking atoms in the sample. If the sample is a crystalline material, with a regular pattern to the arrangement of atoms, these diffracted electrons form a pattern of lines that reveals the particular crystal


January / February 2012 www.compoundsemiconductor.net 215


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