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Page 64


www.us- tech.com


May, 2019


Reducing CTE Mismatch Defects in Flip Chip Reflow


By Patrick Gao, Shoubing Ni, Thomas Tong, and Joe Yang, BTU International, Inc. T


he miniaturization of electronic components has led to the use of copper pillars, smaller bump sizes and narrower pitches. This has


resulted in lower flexibility of joints and more sen- sitivity to the influence of coefficient of thermal expansion (CTE) mismatch. Component tilt, open solder joints and cracks with the use of extreme low-K (ELK) dielectric materials are defects that increase with this trend. BTU’s solution, TrueFlat technology, which


uses negative pressure reflow is designed to allevi- ate yield losses due to CTE mismatch during reflow soldering. Advanced thermal control (ATC) is introduced to control the rates of heat transfer for processes sensitive to abrupt expansion and contraction. ATC is an enhancement of existing control for


heating and cooling rates to achieve continuous, uniform heat transfer. This provides the ability to control the abrupt expansion and contraction stress produced by micro spikes.


Challenges of Miniaturization Silicon flip chip and thin organic substrates


have significantly different CTEs. CTE mismatch for flip chip on thin substrates has been a chal- lenge for more than 10 years. Controlling defects in mass reflow caused by warpage- and CTE stress-related cracks has long been the focus of reflow process engineers. Other reflow techniques, such as thermal compression bonding, are avail- able. However, these processes are expensive and have low throughput, which makes mass reflow a preferred process. Existing mass reflow methods to alleviate the


effects of CTE mismatch consist of a solid carrier acting as a heat spreader, a cover plate to attempt to hold down the substrate during reflow and the


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use of a slow cooling process to control the rate of contraction. This method is being challenged as miniaturization continues. The use of a reduced or negative pressure


(pressure below atmosphere) below the carrier throughout the entire reflow process enhances the contact of the substrate on the carrier and helps to keep the substrate flat.


match. Ensuring contact with the carrier helps to keep the substrate flat and reduces deformation.


Negative Pressure Reflow To demonstrate experimentally, this requires


two stages. The first stage is to ensure effective contact of the substrate to carrier. The second is to control the heating rates for the reflow process. The objective of negative pressure reflow is to gen- erate a continuous suction from the start of heat- ing to the end of the cooling process within the heated chamber. A slow cooling rate profile is adopted to minimize the impact of heat spikes. Figure 1 demonstrates the gas flow to gener-


ate effective suction with edge rail conveyors. Redirection of gas flow on the bottom of the process produces a suction box effect, and a pressure below atmosphere, directly below the conveyor and prod- uct — hence the name “negative pressure reflow.” The carrier design is important for uniform


Figure 1: Negative pressure reflow design. This enhances localized contact below the


chip, where a cover plate is not effective. More effective heat spreading produces greater temper- ature homogeneity and reduces the impact of abrupt expansion and contraction due to CTE mis-


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suction and heating. A large suction hole size cre- ates localized heat spikes. The recommended layout is 0.04 in. (1 mm) diameter hole grid below the sub- strate. There are window and mesh top covers used in standard reflow ovens without suction. Mesh has the advantage of holding down the edges of each chip but has less flexibility and costs much more to produce. Window covers hold down the edges of the substrate and allow different layouts of chips on the substrate. The center of the substrate is subjected to deformation, as there is nothing ensuring proper contact of the substrate to the carrier. Pressure should be measured below the carri-


er with a room temperature fixture overlaid onto a ramp to spike (RTS) slow-cool temperature profile — measured in the same oven. If the suction remains effective throughout the process, it


Continued on next page


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N O T E S


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