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www.us- tech.com


May, 2019


ACL Staticide Intros New Knit ESD Gloves


Find Electronic Failures with Vibration Testing


Benchtop Vibration Table


   


     


Chicago, IL — ACL Staticide® has in- troduced knit ESD gloves to its ESD workbench product line. The gloves protect against static dis- charge and are useful for detailed assembly and inspection work. Washable and reusable, the gloves are offered with and with- out polyurethane fingertips. Lightweight and seamless


in construction, the knit ESD gloves provide a comfortable, breathable fit with low moisture absorption. The micro-knit fin- gertips offer superb dexterity for working in ESD-sensitive areas. Made from blended nylon


conductive yarn, the gloves are available in small to double-XL sizes with color-coded wristbands for easy identification. They are packaged six pairs per pack (six packs per case). ACL Staticide has supplied elec -


tronics manufacturers for 50 years with products for the automotive, avionics, medical device, plastics, and telecommunications industries. ACL offers a range of products that include static control products designed for


Knit ESD gloves with polyurethane fingertips.


ments and enhanced precision prepa- ration products for PCB rework, re-


pair and prototyping. Contact: ACL Inc., 840 W. 49th


Place, Chicago, IL 60609 % 847-981-9212


E-mail: info@aclstaticide.com Web: www.aclstaticide.com


Contact us for more info.


Cincinnati Sub-Zero Cincinnati, OH


www.cszindustrial.com (p) 513-772-8810


EMS Intros Spin-On Liquid Negative Photoresist


Delaware, OH — Engineered Materi- al Systems, Inc., has introduced its NR-5000 series of liquid nega- tive photoresists for microflu- idics and wafer-level metalliza- tion processes. These material formulations have viscosities optimized for wafer coatings from 0.2 to 2 mil (5 to 50 µm) in thickness. The NR-5000 series dry-


film resist also can be used to create various permanent fea- tures on wafers. When used in conjunction with the 412-17


EMS adhesion promoter, the resist is capable of surviving HAST testing on


ESD-protected areas, contamination control products for critical environ-


Diagram of silicon coated with layers of photoresist.


silicon wafers. This liquid resist is capable of extreme fine line and space definition in complex patterns with resolutions down to 0.1 mil (3 µm). The cured chemistry can with- stand harsh environments, including resistance to extreme moisture con- ditions and corrosive chemicals. EMS NR-5000 series liquid re-


sists are tougher (less brittle) than other negative photoresists on the market with glass transition temper- atures ranging from 248 to 392°F (120 to 200°C). The material is hy- drophobic in nature, providing chem- ical and moisture resistance. EMS liquid resists are compatible with and can be used in contact with the EMS line of dry-film negative tone photoresists. The NR-5000 series negative


photoresists are the latest addition to Engineered Materials Systems’ full line of film and liquid negative pho- toresists formulated for lift off process- es, via sealing and making microflu-


idic channels on MEMS devices. Contact: Engineered Materials


Systems, Inc., 100 Innovation Court,


Delaware, OH 43015 % 740-203-2947 E-mail: jprovence@emsadhesives.com Web: www.emsadhesives.com


NEW


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