nitrides, arsenides, phosphides, antimonides, oxides, and novel materials such as graphene. In addition, a modular transfer backbone allows the system to be expanded to add other deposition and metrology technologies. The GENxplor is able to accommodate more configurations than many other MBE system on the market. The process chamber contains new technologies that expand flexibility and capabilities. The first system specifically designed to work with a full complement of bellows-free retractable sources, sources can be maintained, refilled, or changed in isolation from the growth chamber, allowing customers to use the system continuously for years or perhaps even decades without venting.
In addition, the single-frame design with cantilevered growth chamber allows users more convenient access and easier maintenance than ever before. Inside the process chamber, water-cooling is integrated to efficiently remove heat from the system. This can dramatically reduces liquid nitrogen consumption and lowers the operating cost of the system by thousands of dollars a year. Since its introduction in mid-2013, the GENxplor is the best-selling MBE system with five systems sold and counting to customers including University of Oklahoma, University of Nottingham, and McGill University.
holes or pillars on a hexagonal or square lattice, or linear gratings over large areas, with high throughput. The unique feature of PHABLE is the very large depth of focus for optical printing. Unlike any conventional proximity, contact or projection lithography technologies, the printed features are independent of the exposure gap over several hundred micrometres. Therefore printing on non-flat surfaces, such as LED wafers, is easily accomplished.
The EVG PHABLE technology is based on a Displacement Talbot lithography approach, producing features ranging from three microns down to 200 nm. This technology effectively provides no depth-of-focus limitation or stitching and can be used on substrates with poor total thickness variation. This
technology enables pattern substrates up to six inches in diameter in a single exposure step and therefore the system consistently maintains high patterning throughput independent of wafer size. The very large exposure gap between the mask and wafer, avoids process-related mask contamination.
The system can produce both one- dimensional patterns, such as lines and spaces, as well as two-dimensional patterns, such as hexagonal or square lattices. Thus, it supports a variety of approaches to enhance the light extraction from LEDs or to create patterned substrates. Possible applications include LED surface structuring, PSS, photonic crystal applications, nano-wire LEDs and optical gratings.
EVG PHABLE
The PHABLE (for “photonics enabler”) is a patented technology that is targeted for low-cost fabrication of periodic nanostructures that are mainly needed for patterned sapphire substrates (PSS) and photonic applications right now. PHABLE is a mask based UV photolithography technology, enabling existing photo resist and photomask infrastructure. It enables the creation of periodic structures, such as arrays of
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