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Equipment and Materials ♦ news digest


Evatec enhances GaAs PVD processing capabilities in U.S.


The company has delivered multiple RADIANCE cluster sputter tools to a major US GaAs fab supplying products to the RF industry


Evatec is shipping tools to support expansion of the fab’s 6” GaAs production requirements to an undisclosed U.S. company.


The system enables implementation of new bump metallisation and high fill ratio barrier layer processes leading to significant cost savings.


Pictured below is a typical RADIANCE cluster tool with twin cassette stations, central handler with dual arm robot connected to three process modules- a batch process module with five sputter sources, a single process module with one large cathode , and a single process module configured with three smaller sources for co-deposition.


Single process modules can be configured for PVD, PECVD or ICP etch, whilst a 6 process position ‘BATCH’ module can be equipped for sputter and etch processes, allowing for in-situprocesses on the same platform.


The RADIANCE flexibility combined with process knobs such as substrate rotation, target to substrate distance and in situ metrology capabilities such as optical monitoring makes the tool an ideal choice for development and production facilities across a wide range of market applications from compound semiconductors to optoelectronic applications.


Evatec delivers complete process solutions for thin film deposition and etch to the semiconductor, MEMS, optical and optoelectronic industries around the globe. With a technology portfolio including enhanced evaporation and sputtering, Evatec engineers are able to offer practical production advice from R&D to mass production.


Zygo 3D optical profiler enhances surface metrology


The tool can be used to view the surface morphology on III-V based wafers


Zygo Corporation is launching the NewView 8000 series of 3D optical profilers.


This latest generation in the NewView product family, the NewView 8000 systems provide rapid, precise, quantitative, and interactive surface metrology.


Evatec RADIANCE tool


Evatec says it was chosen for their high throughput and superior process stability leading to increased yield and reliability performance.


RADIANCE itself is a sputter tool, which can be configured for multiple technologies on a single platform.


March 2014 www.compoundsemiconductor.net 147


The modular platform has been designed to meet the metrology and budgetary requirements of a wide range of applications in scientific research, product and process development, and volume manufacturing.


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