compound semiconductor ♦ news digest
systems in the country.
The device has applications in memory products, LED, CIS, 3D integration, MEMS, compound semiconductor and automotive integrated circuit yield enhancement and, as such, the firm feels a partnership with Canon MJ is in both organisations’ best interests.
Kunio Kurihara, director of Canon MJ, commented: “By concluding this distribution agreement with Camtek, Canon MJ adds to its line-up wafer inspection systems that can be used in a wide range of semiconductor front- end and back-end applications.”
Camtek specialises in the development of products to enhance production processes and yield and is focused predominantly on the compound semiconductor, printed circuit board and IC substrates markets.
Its products are used to monitor the production of these technologies, with its inspection equipment key to the detection of minor defects and pinpointing where manufacturing improvements can be made.
S2K 2010 event Low carbon technology announced.
2010-03-29
1st & 2nd June 2010, City Hall, Cardiff
Prof. S. Ravi P. Silva, will be the Chairman of this year’s S2K event in Cardiff. Ravi Silva, Professor of Solid State Electronics, is the Director of the Advanced Technology Institute (ATI) at the University of Surrey and heads the Nano-Electronics Centre (NEC), which is an interdisciplinary research activity. The NEC has over 50 research staff.
Speaking about the event Ravi stated “We are all keen to manage carbon emissions and electronics has a particularly important role to play. The development of new materials on the nanoscale is giving us the potential to develop
new and more efficient ways of collecting energy and converting it into useable forms. These materials are also transforming the energy consumption of devices as mundane, but important as lighting applications. We are looking forward to showcasing these new technologies during 2010’s event”
One of the keynote speakers during the event will be Bedwyr Humphreys, General Manager of NanoGaN Ltd., a subsidiary of IQE plc, which is developing and manufacturing free standing gallium nitride substrates that are used in the manufacture of blue laser diodes for optical storage and UHB-LEDs for solid-state lighting (SSL). A key driver for rapid adoption of high power UHB-LEDs in SSL is the need for much higher efficacy devices, which realistically, can only be manufactured using low defect density free-standing GaN substrates. Commenting on the opportunity to talk at this year’s S2K conference, Dr Humphreys added “We are keen to create awareness of new materials which will revolutionise the lighting industry once they enter mainstream production.
The use of these materials offers the potential to significantly reduce energy consumption and carbon emissions”. Other confirmed speakers include: Malcolm Penn – Future Horizons, Ed Ostan – Plasma-Therm, Martin Behringer – OSRAM, PK Nathan – Brunel University, Raghu Das – ID Tech X and Michael LeGoff - Plessey First launched in the year 2000, Semiconductor 2000 as it was then known was designed to create a platform for dialogue and business development for the semiconductor industry. The event now supports many of the niche sectors which have developed over the past decade as well as supporting the traditional spirit of the event which was to give European based companies and in particular UK companies a global overview of market development and upcoming trends.
This year’s S2K event which will be held in Cardiff on the 1st and 2nd June will build on the new format of 2009 where several new features were incorporated and resulted in a very
April/May 2010
www.compoundsemiconductor.net 77
Page 1 |
Page 2 |
Page 3 |
Page 4 |
Page 5 |
Page 6 |
Page 7 |
Page 8 |
Page 9 |
Page 10 |
Page 11 |
Page 12 |
Page 13 |
Page 14 |
Page 15 |
Page 16 |
Page 17 |
Page 18 |
Page 19 |
Page 20 |
Page 21 |
Page 22 |
Page 23 |
Page 24 |
Page 25 |
Page 26 |
Page 27 |
Page 28 |
Page 29 |
Page 30 |
Page 31 |
Page 32 |
Page 33 |
Page 34 |
Page 35 |
Page 36 |
Page 37 |
Page 38 |
Page 39 |
Page 40 |
Page 41 |
Page 42 |
Page 43 |
Page 44 |
Page 45 |
Page 46 |
Page 47 |
Page 48 |
Page 49 |
Page 50 |
Page 51 |
Page 52 |
Page 53 |
Page 54 |
Page 55 |
Page 56 |
Page 57 |
Page 58 |
Page 59 |
Page 60 |
Page 61 |
Page 62 |
Page 63 |
Page 64 |
Page 65 |
Page 66 |
Page 67 |
Page 68 |
Page 69 |
Page 70 |
Page 71 |
Page 72 |
Page 73 |
Page 74 |
Page 75 |
Page 76 |
Page 77 |
Page 78 |
Page 79 |
Page 80 |
Page 81 |
Page 82 |
Page 83 |
Page 84 |
Page 85 |
Page 86 |
Page 87 |
Page 88 |
Page 89 |
Page 90 |
Page 91 |
Page 92 |
Page 93 |
Page 94 |
Page 95 |
Page 96 |
Page 97 |
Page 98 |
Page 99 |
Page 100 |
Page 101 |
Page 102 |
Page 103 |
Page 104 |
Page 105 |
Page 106 |
Page 107 |
Page 108 |
Page 109 |
Page 110 |
Page 111 |
Page 112 |
Page 113 |
Page 114 |
Page 115 |
Page 116 |
Page 117 |
Page 118 |
Page 119 |
Page 120 |
Page 121 |
Page 122 |
Page 123 |
Page 124 |
Page 125 |
Page 126 |
Page 127 |
Page 128 |
Page 129 |
Page 130 |
Page 131 |
Page 132 |
Page 133 |
Page 134 |
Page 135 |
Page 136 |
Page 137 |
Page 138 |
Page 139 |
Page 140 |
Page 141 |
Page 142 |
Page 143 |
Page 144 |
Page 145 |
Page 146 |
Page 147 |
Page 148 |
Page 149 |
Page 150 |
Page 151 |
Page 152 |
Page 153 |
Page 154 |
Page 155 |
Page 156 |
Page 157 |
Page 158 |
Page 159 |
Page 160 |
Page 161 |
Page 162 |
Page 163 |
Page 164 |
Page 165 |
Page 166 |
Page 167 |
Page 168 |
Page 169 |
Page 170 |
Page 171 |
Page 172 |
Page 173 |
Page 174 |
Page 175 |
Page 176 |
Page 177 |
Page 178 |
Page 179 |
Page 180 |
Page 181 |
Page 182 |
Page 183 |
Page 184 |
Page 185 |
Page 186 |
Page 187 |
Page 188 |
Page 189 |
Page 190 |
Page 191 |
Page 192 |
Page 193 |
Page 194 |
Page 195 |
Page 196 |
Page 197 |
Page 198 |
Page 199 |
Page 200 |
Page 201 |
Page 202 |
Page 203 |
Page 204 |
Page 205 |
Page 206 |
Page 207 |
Page 208 |
Page 209 |
Page 210 |
Page 211 |
Page 212 |
Page 213 |
Page 214 |
Page 215 |
Page 216 |
Page 217 |
Page 218 |
Page 219 |
Page 220 |
Page 221 |
Page 222 |
Page 223 |
Page 224 |
Page 225 |
Page 226 |
Page 227 |
Page 228 |
Page 229 |
Page 230 |
Page 231 |
Page 232 |
Page 233 |
Page 234 |
Page 235 |
Page 236 |
Page 237 |
Page 238 |
Page 239 |
Page 240 |
Page 241 |
Page 242 |
Page 243 |
Page 244 |
Page 245 |
Page 246 |
Page 247 |
Page 248 |
Page 249 |
Page 250 |
Page 251 |
Page 252 |
Page 253 |
Page 254 |
Page 255 |
Page 256 |
Page 257 |
Page 258 |
Page 259 |
Page 260 |
Page 261 |
Page 262 |
Page 263 |
Page 264 |
Page 265 |
Page 266 |
Page 267 |
Page 268 |
Page 269 |
Page 270 |
Page 271 |
Page 272