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About WITec WITec is a manufacturer of high performance optical and scanning probe microscopy systems. A modular product line allows the combination of different microscopy techniques such as Raman, SNOM or AFM in a single instrument for flexible analysis of the optical, chemical and structural properties of a sample. The instruments are distributed worldwide and are used primarily in the fields of Materials Science, Life Science and Nanotechnology. WITec is based in Ulm, Germany and Maryville, TN, USA. For more information, please visit

http://www.witec.de.

Wafer-Level Camera Manufacturer, Nemotek Technologie, Selects EV Group Wafer Bonding and UV Nanoimprint Lithography Systems for Capacity Ramp

2010-03-30

Follow-on Order Demonstrates the Strength of EVG’s High-volume Manufacturing Solutions for Wafer-level Camera Applications

EV Group, supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that Morocco-based wafer-level camera manufacturer Nemotek Technologie has placed a repeat order for EVG’s bonding and UV nanoimprint lithography (UV-NIL) systems – the EVG520IS and IQ Aligner. Nemotek will use these systems to address its production demands for CMOS image sensors and wafer-level optics that will be deployed in wafer-level cameras for mobile applications.

This order marks a significant win for EVG as it paves the way for a long-term partnership with Nemotek – and further bolsters EVG’s dominant position as the preferred bonding and UV-NIL equipment provider for wafer-level camera applications.

As the size of the camera in mobile phones

160 www.compoundsemiconductor.net April/May 2010

can be a limiting factor in mobile handset designs, there is an increasing demand for smaller camera modules that can still address the call for higher resolution and cost effectiveness. This has shifted manufacturing of both the CMOS image sensor and the micro-optics stack to the wafer level, which in turn has created new manufacturing challenges. Manufacturing these devices at the wafer level requires precision alignment and effective bonding in multiple layers of the optical stack in order to reach maximum device performance. Known for its ability to align wafers with extremely high accuracy, EVG’s IQ Aligner is the only industry-proven, high-volume manufacturing solution for wafer lens molding and stacking available today.

“Demand continues to rise for wafer-level cameras, and we are ramping up our production capabilities in order to meet our customers’ needs,” said Jacky Perdrigeat, chief executive officer of Nemotek Technologie. “To support our production expansion efforts, we selected EV Group’s wafer bonding and UV- NIL systems not only for their high-volume capabilities, but also for their support of our preferred wafer-level technology process. The quality of the technical results and the repeatability that we have witnessed in using the existing EVG systems in our state-of-the- art cleanroom also weighed heavily in our selection process.”

Paul Lindner, executive technology director of EV Group, noted, “This opportunity to further support Nemotek’s capacity needs is testament to the strength of our wafer-level solutions portfolio, which features field-proven, high-volume capabilities. It also validates our success in parlaying our long-time expertise in the manufacture of CMOS image sensors to handle the shift to wafer-level production for the overall optics market. We value the confidence Nemotek has placed in our wafer bonding, UV-NIL lens molding and aligned UV bonding technologies for their wafer-level camera applications, and look forward to opportunities to not only expand our relationship, but also Page 1  |  Page 2  |  Page 3  |  Page 4  |  Page 5  |  Page 6  |  Page 7  |  Page 8  |  Page 9  |  Page 10  |  Page 11  |  Page 12  |  Page 13  |  Page 14  |  Page 15  |  Page 16  |  Page 17  |  Page 18  |  Page 19  |  Page 20  |  Page 21  |  Page 22  |  Page 23  |  Page 24  |  Page 25  |  Page 26  |  Page 27  |  Page 28  |  Page 29  |  Page 30  |  Page 31  |  Page 32  |  Page 33  |  Page 34  |  Page 35  |  Page 36  |  Page 37  |  Page 38  |  Page 39  |  Page 40  |  Page 41  |  Page 42  |  Page 43  |  Page 44  |  Page 45  |  Page 46  |  Page 47  |  Page 48  |  Page 49  |  Page 50  |  Page 51  |  Page 52  |  Page 53  |  Page 54  |  Page 55  |  Page 56  |  Page 57  |  Page 58  |  Page 59  |  Page 60  |  Page 61  |  Page 62  |  Page 63  |  Page 64  |  Page 65  |  Page 66  |  Page 67  |  Page 68  |  Page 69  |  Page 70  |  Page 71  |  Page 72  |  Page 73  |  Page 74  |  Page 75  |  Page 76  |  Page 77  |  Page 78  |  Page 79  |  Page 80  |  Page 81  |  Page 82  |  Page 83  |  Page 84  |  Page 85  |  Page 86  |  Page 87  |  Page 88  |  Page 89  |  Page 90  |  Page 91  |  Page 92  |  Page 93  |  Page 94  |  Page 95  |  Page 96  |  Page 97  |  Page 98  |  Page 99  |  Page 100  |  Page 101  |  Page 102  |  Page 103  |  Page 104  |  Page 105  |  Page 106  |  Page 107  |  Page 108  |  Page 109  |  Page 110  |  Page 111  |  Page 112  |  Page 113  |  Page 114  |  Page 115  |  Page 116  |  Page 117  |  Page 118  |  Page 119  |  Page 120  |  Page 121  |  Page 122  |  Page 123  |  Page 124  |  Page 125  |  Page 126  |  Page 127  |  Page 128  |  Page 129  |  Page 130  |  Page 131  |  Page 132  |  Page 133  |  Page 134  |  Page 135  |  Page 136  |  Page 137  |  Page 138  |  Page 139  |  Page 140  |  Page 141  |  Page 142  |  Page 143  |  Page 144  |  Page 145  |  Page 146  |  Page 147  |  Page 148  |  Page 149  |  Page 150  |  Page 151  |  Page 152  |  Page 153  |  Page 154  |  Page 155  |  Page 156  |  Page 157  |  Page 158  |  Page 159  |  Page 160  |  Page 161  |  Page 162  |  Page 163  |  Page 164  |  Page 165  |  Page 166  |  Page 167  |  Page 168  |  Page 169  |  Page 170  |  Page 171  |  Page 172  |  Page 173  |  Page 174  |  Page 175  |  Page 176  |  Page 177  |  Page 178  |  Page 179  |  Page 180  |  Page 181  |  Page 182  |  Page 183  |  Page 184  |  Page 185  |  Page 186  |  Page 187  |  Page 188  |  Page 189  |  Page 190  |  Page 191  |  Page 192  |  Page 193  |  Page 194  |  Page 195  |  Page 196  |  Page 197  |  Page 198  |  Page 199  |  Page 200  |  Page 201  |  Page 202  |  Page 203  |  Page 204  |  Page 205  |  Page 206  |  Page 207  |  Page 208  |  Page 209  |  Page 210  |  Page 211  |  Page 212  |  Page 213  |  Page 214  |  Page 215  |  Page 216  |  Page 217  |  Page 218  |  Page 219  |  Page 220  |  Page 221  |  Page 222  |  Page 223  |  Page 224  |  Page 225  |  Page 226  |  Page 227  |  Page 228  |  Page 229  |  Page 230  |  Page 231  |  Page 232  |  Page 233  |  Page 234  |  Page 235  |  Page 236  |  Page 237  |  Page 238  |  Page 239  |  Page 240  |  Page 241  |  Page 242  |  Page 243  |  Page 244  |  Page 245  |  Page 246  |  Page 247  |  Page 248  |  Page 249  |  Page 250  |  Page 251  |  Page 252  |  Page 253  |  Page 254  |  Page 255  |  Page 256  |  Page 257  |  Page 258  |  Page 259  |  Page 260  |  Page 261  |  Page 262  |  Page 263  |  Page 264  |  Page 265  |  Page 266  |  Page 267  |  Page 268  |  Page 269  |  Page 270  |  Page 271  |  Page 272