news digest ♦ Equipment and Materials
Dan Ayres will report to Jonathan Flint, CEO of Oxford Instruments plc, who comments, “Our business strategy demands an organisation that can meet the challenge of expanding markets, new products, and growing numbers of customers and employees. Dan’s new appointment will ensure that Oxford Instruments Plasma Technology continues its current growth plans, and I am confident that with Dan heading the strong Executive Team in place at the company, this will be achieved.”
“I am delighted to have this opportunity to lead our highly skilled team and I look forward to working with them to build on the success of recent years”, comments Dan Ayres, “In line with our strategic plan we will focus on innovating improved etch, deposition and growth solutions to meet our customers’ needs for new systems, continuous performance improvement and after-sales support. We will support our focus on innovation by investing in improved business processes to ensure we deliver a healthy and growing business for our employees, shareholders and other stakeholders”
on May 15, 2012, at the Grazer Congress Conference Centre, Graz, Austria.
Rik Pintelon received the degree of Electrotechnical- Mechanical Engineer in July 1982, the degree of doctor in applied science in January 1988, and the qualification to teach at university in April 1994, all from the Vrije Universiteit Brussel (VUB), Brussels, Belgium.
Until September 2000, he was a Research Director of the Fund for Scientific Research – Flanders (FWO) and part-time lecturer at the VUB in the Electrical Measurement Department (ELEC). He is currently a full-time professor at ELEC. His main research interests are in parameter estimation, system identification, and signal processing.
The award’s IEEE Evaluation Committee consider innovation and development, social value, concept uniqueness, other technical accomplishments, and the quality of the nominations.
The award is administered through the Technical Field Awards Council of the IEEE Awards Board and is independent of Keithley Instruments.
SITE Services changes its
name to Spintrac Systems The name change is to re-brand the company and allow it to showcase the wide range of proprietary systems that SITE Services has developed. These include indium phosphide and gallium arsenide substrates
Mark Vosloo, Sales, CS & Marketing Director, Oxford Instruments Plasma Technology
At the same time, Mark Vosloo, Sales & Customer Support Director has taken over responsibility for all customer facing functions including strategic marketing and holds the new title Sales, CS & Marketing Director.
Pintelon receives 2012 IEEE Keithley award
The researcher of parameter estimation, system identification, and signal processing has been awarded for innovative system identification methods for measurement applications
Rik Pintelon is the recipient of the 2012 IEEE Joseph F. Keithley Award in Instrumentation and Measurement.
Pintelon is being recognised for the development of innovative system identification methods for measurement applications. The award, sponsored by Keithley Instruments, is presented for outstanding contributions in the field of electrical measurement. It consists of a bronze medal, a certificate, and an honorarium.
Pintelon will receive the award at the 2012 IEEE International Instrumentation and Measurement Technology Conference,
168
www.compoundsemiconductor.net April/May 2012
After more than 30 years of continuous operation under the name SITE Services, the company has changed its name to Spintrac Systems, Inc. “The change had been contemplated over many years as the nature of the company’s business grew from being a service and training company (Semiconductor Industry Training and Electronic Services) to one that currently designs and builds its own line of photolithography coater and developer systems,” says SITE Services President Alan W. Kukas. This name change is an opportunity to re-brand the company and allow the firm to showcase the wide range of proprietary systems that SITE Services has developed. The company’s processing systems were initially targeted towards silicon wafers but now extend into many specialised substrates including compound semiconductors such as InP and GaAs. The firm also deals with sapphire, glass and ceramic varying in size from 2” to 320 mm x 380 mm plates. Many systems work in a 24/7 production environment while others are utilised in R&D facilities pertaining to nanotechnology, displays and process chemicals.
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