news digest ♦ Equipment and Materials customer support office in Shanghai, China.
Yun Liu, Asian Business Manager and Voltaix’s first employee in China, will be responsible for executing the regional sales and marketing initiatives. Yun has an MBA from the University of Ottawa as well as Bachelor Degree in Mechanical Engineering from Shanghai University. Over the past five years he has held various positions with a large industrial gas company driving growth in solar, semiconductor and TFT applications. The office will allow for an expanded sales and marketing staff in the future.
“Sustainable growth of Voltaix chemistries in China for solar and semiconductor applications is expected to continue well into the future. We felt the need to bring resources closer to our distribution partners and end users to provide timely technical and customer support. Voltaix’s decision to expand into China illustrates our commitment to better understanding the market in China and improve the overall customer experience. We are pleased to have someone with Yun’s experience join the Voltaix team,” said Greg Muhr, Director, Global Sales & Marketing of Voltaix.
Voltaix manufactures specialty materials that enhance the performance and manufacturability of semiconductors and photovoltaics. Utilising its expertise in silicon, germanium and boron chemistry, its products are custom designed for the most demanding applications, including SiGe transistors for wireless communications chips.
Voltaix manufactures of a number of electronics products, including germane, diborane, trisilane, and trimethyl boron. The firm uses proprietary synthesis, purification, and packaging technology developed in-house. It also designs and builds its own equipment for use in our manufacturing operations.
Sentech reveals PEALD tool for precise thickness control
The plasma enhanced atomic layer deposition system can be used in a variety of applications including compound semiconductor growth.
Atomic layer deposition (ALD) is a layer-by-layer deposition process of very thin films with conformal
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www.compoundsemiconductor.net November/December 2011 coating on 3D structures.
Precise control of thickness and film properties is facilitated by adding precursors in separate steps into the vacuum chamber during process cycle. Plasma enhanced atomic layer deposition (PEALD) is an advanced method of extending the capabilities of ALD by applying radical gas species rather than water as oxidiser during the deposition process.
Based on many years of experience in developing and manufacturing PECVD and ICPECVD equipment, including the proprietary planar triple spiral antenna ICP source, Sentech has launched its first PEALD system. The new ALD system enables both thermal and plasma assisted operation and deposition monitoring using Sentech ellipsometers.
Sentech offers leading edge ultra-fast in-situ ellipsometers for monitoring layer-by-layer film growth applying laser ellipsometry as well as wide range spectroscopic ellipsometry.
The first PEALD system was already set in operation at the TU Braunschweig for the deposition of extremely uniform and dense thin oxide films like Al2O3 and ZnO. For the deposition of Al2O3, TMA (C3H9Al) and plasma generated atomic oxygen ‘O’ were utilised at substrate temperatures from 80°C to 200°C.
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