This page contains a Flash digital edition of a book.
Lasers ♦ news digest


The green gap (540-610nm) is a major obstacle in the development of high-efficiency solid state lighting applications. It’s well known that LEDs produced in the green region, between red and blue, have rapidly declining efficiency.


Green and yellow in the middle of the colour spectrum, known as the “green gap”, is a section of the light spectrum where devices made from either nitride or phosphide are inefficient and difficult to fabricate.


Meaglow says its reactor overcomes these difficulties by utilising its patent pending hollow cathode and low temperature growth process which is capable of growing the volatile compound of indium required to make green and yellow diodes.


Having a nitride device that emits strongly in the yellow is a monumental step forward for low temperature InGaN growth.


Meaglow also says the quality of InGaN produced by its technique is pioneering the industry. Results for this test device were presented to scientists in the nitride semiconductor research community at the recent ISSLED2012 conference held in Berlin, Germany.


The firm is now focused on commercialising its InGaN technology, and is looking for partners interested in creating next generation devices using the thick InGaN template layers.


Stuttgart University orders another Aixtron tool for laser research


The 3x2” MOCVD CCS reactor will be used for the growth of gallium arsenide solid state lasers and III-V materials on silicon


The University of Stuttgart has made a repeat order for Aixtron’s CCS (Close Coupled Showerhead) system that is capable of handling three 2-inch (3x2”) substrates at a time.


The system will be used by University of Stuttgart’s Institute of Semiconductor Optics and Functional Interfaces (Institut für Halbleiteroptik und


October 2012 www.compoundsemiconductor.net 89 Funktionelle Grenzflächen, IHFG) research group.


IHFG researchers specialise in semiconductor optics and epitaxy.


The new Aixtron system will be used to expand IHFG’s work in GaAs based optoelectronics, in particular, producing material for solid state lasers.


The order was booked in the first quarter of 2012 and the reactor will be delivered in the third quarter of 2012.


Michael Jetter of IHFG comments, “We want to use the CCS 3x2” in two ways: on the one hand we want to produce our GaAs-based laser structures on GaAs, but we also want to transfer them to silicon substrates. As a specialist in semiconductor optics, the Institute’s main research areas are semiconductor lasers and low dimensional structures such as quantum wells (QWs) and quantum dots (QDs).”


One focus of the work will be quantum cryptography and single photon emitters. However, the researchers also foresee opportunities arising from their efforts in automotive electronics. In particular, the researchers plan to grow III-V materials on silicon substrates using Aixtron’s MOCVD technology.


Jetter adds, “We would like to give silicon electronics an optic touch, which means that we want to monolithically integrate III-V optoelectronic devices (lasers and LEDs, either QW- or QD-based) into CMOS-compatible silicon substrates. These can then be used for the optical data interconnects either on-chip, chip-to-chip or as board-to-board connectors.”


The Aixtron equipment will be also used by the Stuttgart Research Centre of Photonic Engineering (SCoPE), which aims to improve interdisciplinary collaborations between scientists and engineers at the Universität Stuttgart.


IHFG and Aixtron plan to work together in the future on joint research and to co-operate on other scientific programs in the Stuttgart region, focusing on III-V growth on silicon.


Page 1  |  Page 2  |  Page 3  |  Page 4  |  Page 5  |  Page 6  |  Page 7  |  Page 8  |  Page 9  |  Page 10  |  Page 11  |  Page 12  |  Page 13  |  Page 14  |  Page 15  |  Page 16  |  Page 17  |  Page 18  |  Page 19  |  Page 20  |  Page 21  |  Page 22  |  Page 23  |  Page 24  |  Page 25  |  Page 26  |  Page 27  |  Page 28  |  Page 29  |  Page 30  |  Page 31  |  Page 32  |  Page 33  |  Page 34  |  Page 35  |  Page 36  |  Page 37  |  Page 38  |  Page 39  |  Page 40  |  Page 41  |  Page 42  |  Page 43  |  Page 44  |  Page 45  |  Page 46  |  Page 47  |  Page 48  |  Page 49  |  Page 50  |  Page 51  |  Page 52  |  Page 53  |  Page 54  |  Page 55  |  Page 56  |  Page 57  |  Page 58  |  Page 59  |  Page 60  |  Page 61  |  Page 62  |  Page 63  |  Page 64  |  Page 65  |  Page 66  |  Page 67  |  Page 68  |  Page 69  |  Page 70  |  Page 71  |  Page 72  |  Page 73  |  Page 74  |  Page 75  |  Page 76  |  Page 77  |  Page 78  |  Page 79  |  Page 80  |  Page 81  |  Page 82  |  Page 83  |  Page 84  |  Page 85  |  Page 86  |  Page 87  |  Page 88  |  Page 89  |  Page 90  |  Page 91  |  Page 92  |  Page 93  |  Page 94  |  Page 95  |  Page 96  |  Page 97  |  Page 98  |  Page 99  |  Page 100  |  Page 101  |  Page 102  |  Page 103  |  Page 104  |  Page 105  |  Page 106  |  Page 107  |  Page 108  |  Page 109  |  Page 110  |  Page 111  |  Page 112  |  Page 113  |  Page 114  |  Page 115  |  Page 116  |  Page 117  |  Page 118  |  Page 119  |  Page 120  |  Page 121  |  Page 122  |  Page 123  |  Page 124  |  Page 125  |  Page 126  |  Page 127  |  Page 128  |  Page 129  |  Page 130  |  Page 131