news review Samsung invests in Voltaix
VOLTAIX, a provider of materials that enhance the performance of semiconductor chips, solar cells, and other electronic devices has secured growth financing from Samsung Venture Investment Corporation (SVIC), the global investment arm of
Samsung.Both companies have remained tight-lipped about the amount invested.
Voltaix manufactures electronic chemicals and gases used in semiconductor manufacturing processes at major integrated circuit fabs worldwide. The company also supplies deposition precursors for the production of advanced photovoltaic cells. New Voltaix materials will also enable next generation LED and power electronics advancements and cost reductions. “The financing from SVIC will enable us to continue building our
worldwide infrastructure and will further accelerate our new product pipeline development activities,” says Peter Smith, CEO of Voltaix. “We believe our materials innovations will help drive new device architectures and manufacturing technologies to high volume manufacturing,” Smith adds.
Dong-Su Kim, SVIC Senior Investment Director notes, “The increasing demand for novel gases and materials in electronics fabrication has attracted our attention. Based on our analysis of the future demand and the players in the space, we found Voltaix to be the leader and are quite excited about our equity investment.”
The firm manufactures specialty materials that enhance the performance and manufacturability of semiconductors and photovoltaics. Voltaix’s products are custom designed for applications, including SiGe transistors for wireless communications chips.
Voltaix materials enable solar cells to absorb a broader portion of the solar spectrum, and they improve manufacturability by minimising defect formation and increasing machine throughput.
Agnitron designs MOCVD flange to improve GaN growth
AGNITRON TECHNOLOGY has completed design activities for its proprietary MOCVD Monolithic Dual Flow Gas Injection Flange and has started to fabricate a prototype. The new MOCVD injection flange was designed as an upgrade for E300 GaNzillas I & II reactors. These are used or refurbished MOCVD GaN reactors, usually originally manufactured by Veeco, Emcore or Aixtron.
The flange is suited for use in the growth of III-nitrides, ZnO and MgZnO but can also be configured for the growth of any material. It can also be used for Atomic Layer Deposition and is compatible with remote plasma sources and induction heating. Device applications include UV LED and HEMT structures. The component enables adjustable velocity and density matching between alkyls and
hydrides. Alkyl and hydride injection is completely isolated and the firm says the solid design makes H2 leakage impossible. Agnitron says the use of the flange will provide superior thickness and photoluminescence uniformity across wafer and from wafer-to-wafer. Radical disturbances in the boundary layer are now easily prevented by process tuning of alkyl and hydride gases flow velocity and density.
“The Monolithic Dual Flow Gas Injection Flange concept has been a desire for process engineers over the years. Agnitron Technology’s development of the revolutionary flange was in response to this unmet industry need,” says Dennis Stucky, who managed field services for Emcore and Veeco, and is collaborating with Agnitron on several projects.
10
www.compoundsemiconductor.net October 2012 US gives
BluGlass patent the green light
AUSTRALIAN clean-tech innovator BluGlass has announced that its patent US2008272463, “Method and apparatus for growing a group (III) metal nitride film” has now been allowed in the U.S.
This patent, once granted in the coming weeks, brings the company’s international patent portfolio up to 16 granted patents in key semiconductor markets including the U.S., Europe, Japan, Korea and China. These patents help to provide the company with broad protection of its Remote Plasma Chemical Vapour Deposition (RPCVD) technology and underpin the commercial opportunities for BluGlass in the production of high efficiency semiconductor devices such as LEDs and solar cells.
BluGlass says its RPCVD technology has many advantages over conventional manufacturing technologies such as MOCVD. It is a lower temperature process which leads to potential performance and cost advantages in the production of LEDs and solar cells. Following further technical advancements made by the company, BluGlass has recently lodged two additional patents through its joint venture EpiBlu. BluGlass CEO, Giles Bourne says, “We are pleased that we had another core patent accepted in the U.S. which will further help us to protect BluGlass technology assets, enabling the company to continue to move towards commercialising the RPCVD technology.”
Building upon and continuing to expand a broad based international patent portfolio is fundamental to the commercialisation of the BluGlass technology. In addition to the 16 granted patents, BluGlass now has 17 provisional patents in four patent families filed in key semiconductor manufacturing countries. Apart from its JV, EpiBlu, the company also has a subsidiary, BluSolar, which is now exploring the process viability of RCPVD in photovoltaic (solar) applications.
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