EMS GRIDS & TEM SUPPORT FILMS CATALOG EDITION V TEM WINDOW GRIDS
zzz Silicon Nitride TEM Window Grids
Silicon Nitride TEM Window Grids perform well under harsh lab conditions.
zzz Silicon Dioxide TEM Window Grids
Engineered to be easier to handle.
By making the grids slightly narrower users now have easy access to grids in TEM holders. No more fumbling with tweezers while trying to pick
Silicon frames are 100µm thick. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
Features
z Plasma Cleanable — can be vigorously plasma cleaned to remove organic contamination
z Field to Field Uniformity — Less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid
z Tolerates temperatures above 1000°C — Supports use in environmental TEMs where dynamic processes are observed at high temperatures
z Withstands Harsh Conditions — Provides an ideal balance of imaging resolution, chemical stability and mechanical strength
z Incorporates LPCVD, low-stress (~250MPa), non-stoichiometric silicon nitride — Provides flat, insulating and hydrophobic surfaces
Recommended Use High Resolution
Imaging: Robust, Increased 10nm
High Resolution: Everyday Imaging: 20nm
Demanding Conditions:
Materials & Cryo-EM Suspension:
50nm 5nm 76042-43, 1 square (25x25µm)
76042-44, 9 squares (50x50µm) 76042-45, 2 slots (50x1500µm)* 76042-46, 9 squares (100x100µm)
76042-49, 1 square (500x500µm) 76042-50, 9 squares (100x100µm) 76042-53, 1 square (100x100µm)
76042-52, 1 square (500x500µm) 76042-51, 1 square (1000x1000µm) 76042-50, 9 squares (100x100µm)
Microporous 76042-41, 1 square (500x500µm) 76042-40, 1 square (500x500µm)
*Coated with 1 nm of ultrahigh purity carbon to minimize charging
Ordering Information Cat. No
500µm sq. 500µm sq.
500µm sq. 25µm sq. Window(s) (Dim.) SiN (Th)
Silicon Nitride Microporous TEM Window Grids (2.0 µm pores with labeled grid) 76042-40 76042-41
Silicon Nitride Nanoporous TEM Window Grid 76042-42
Silicon Nitride TEM Window Grids 76042-43 76042-44 76042-45 76042-46 76042-47 76042-48 76042-49 76042-50 76042-51 76042-52 76042-53
(9) 100µm sq. 1000µm sq. 500µm sq. 100µm sq.
64
(8) 50µm sq., (1) 50x100µm (2) 50x1500µm
(8) 100 sq., (1) 100x350µm (8) 250 sq., (1) 250x500µm (8) 100 sq., (1) 100x350µm 500µm sq.
20nm 50nm
20nm
5nm 5nm 5nm
10nm 10nm 20nm 20nm 50nm 50nm 50nm 50nm
Qty
10/pk 10/pk
10/pk
10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk 10/pk
up or put down grids. The new TEM Window grid shape is still compatible with all standard holders. TEM Window dimensions are 2.9mm in diameter and 100µm thick.
Features
z Plasma Cleanable — Can be vigorously plasma cleaned to remove organic contamination
z Field to Field Uniformity — Reduced variability
z Tolerates temperatures above 1000°C — Supports use in environ- mental TEMs where dynamic processes are observed at high tempera- tures
z Withstands Harsh Conditions — Provides an ideal balance of imaging resolution, chemical stability and mechanical strength
z Incorporates stoichiometric silicon dioxide — Offers the ability to analyze for nitrogen by EDX techniques
Specifications
100 micron thick frame, fits 3 mm sample holders Non-Porous films are lightly wrinkled with approximately 5 microns or less deflection across 100 microns of travel. This is typically not problematic for high-resolution imaging.
GFLAT silicon oxide films are created by a proprietary process that uniquely results in flat, suspended silicon oxide membranes. These membranes are ideally suited for biological imaging studies, with a glass-like hydrophilic surface. These TEM Windows are essentially micro-scale glass cover slips.
Ordering Information Cat. No
Window(s)(Dim.)
Non-Porous Silicon Dioxide TEM Windows 76042-90 76042-91
(8) 100µm, (1) 100x350µm (8) 50µm, (1) 50x100µm
Non-Porous Silicon Dioxide G-FLAT Window 76042-92
1000µm sq.
zzz Silicon Apertures No-membrane frames
Our Silicon Apertures feature the same TEM window grid-style chip size but lack any suspended membrane so that there is a freely accessible opening through the chip frame.
Features
Background-free Imaging – Open apertures for free suspension of materials so that they can be imaged without intervening membranes
Plasma Cleanable – Silicon apertures can be vigorously plasma cleaned to remove organic contamination
Silicon Composition – Chip frames comprise P-type doped silicon Cat. No.
Description
76043-03-10 Aperture Grid w/single 50 micron square 76043-04-10 Aperture Grid w/single 100 micron square 76043-05-10 Aperture Grid w/single 500 micron square
Qty
10/pk 10/pk 10/pk
SiO2 (Th)
40nm 20nm
100nm Qty
10/pk 10/pk
10/pk
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