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that are made from the AlInGaP material family. At EV Group, which is based in St. Florian, Austria, we are supporting the manufacturing of LEDs produced with a metal bonding process. Our involvement includes the recent launch of the first tool dedicated to this fabrication step – the EVG 560HBL. This piece of equipment is designed to deliver very high yields thanks to optimisation of pressure and temperature distributions, and it sets a new benchmark for throughput of up to 176 bonds- per-hour for 2-inch wafer equivalents.


A little history… Wafer-to-wafer bonding is not new. It was developed 20-30 years’ ago to address the need for wafer-level capping of MEMS devices. Pioneers of wafer- bonding used anodic bonding and glass frit bonding to attach one wafer to another. However, these two approaches are being superseded by metal bonding technologies, which offer a lower form factor.


The metal bonding approach is the only one that is applicable to high-brightness LEDs, due to the requirement for low thermal resistance. This is not the only benefit of this type of bond, however – it can also increase the luminous efficiency of the device. It was first used in AlInGaP-based LEDs that are grown on GaAs substrates. Spontaneous emission from these devices is assumed to be isotropic, with half of all the light generated propagating towards the substrate, where most of it is absorbed, leading to lowering of overall device efficiency. Inserting a distributed Bragg reflector beneath the light-generating region of the LED could prevent this light loss to the substrate, but in practice this only works effectively on one optimised direction of light emission, and it is better to turn to wafer bonding, where a reflective layer is included in the metal stack (see Figure 1).


Manufacturing nitride LEDs with a metal bonding process presents some different challenges. Sapphire, the most widely used platform for making blue and white LEDs, has the desirable attribute of high transparency, but it is a poor heat conductor. Consequently, high-power LEDs employing a lateral design are poor at dissipating their heat and run hot, which degrades device performance. To combat this, some LED manufacturers have developed vertical LED designs, which involve substituting sapphire for another carrier with higher thermal conductivity (see Figure 1).


Switching to this design also simplifies the manufacturing process by eliminating an etching step required to form the n-contact in a lateral LED. In addition, the vertical architecture produces a vertical current path, leading to a lower forward bias and eliminating current crowding issues that are frequently seen for other LED designs. And there are


July 2011 www.compoundsemiconductor.net 29


Figure 2: A scanning electron


microscopy cross-sectional image


highlights the high quality of the join


between an InP and GaAs wafer after Au:Sn eutectic wafer bonding


other benefits too: the addition of the metal bonding layer ensures that all of the light exits from the top of the LED; and manufacturing may be simplified, because the vertical LED design uses the same process flow for different die sizes.


Every vertical LED process flow begins by depositing a stack of epitaxial layers on a substrate by MOCVD. Some engineers will then turn to the patterning of the LED dies, while others will begin with layer transfer by wafer bonding. The decision of what order to perform the various processing steps is primarily governed by the nature of downstream processing


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