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Improving efficiency
through power supply Manufacturers of compound semiconductors look for every opportunity to improve process or yield. HÜTTINGER discusses the energy supply needs for manufacturers and decide that efficiency and robustness are the main requirements for power supplies in semiconductor production.
T
he semiconductor industry is constantly faced with significant change as the industry continues to scale devices and develop new manufacturing techniques. Extreme fluctuations in supply and demand, merciless price wars and short innovation cycles contribute to continual pressure on companies. To remain competitive, companies must be flexible, innovative and constantly find new methods to keep production costs down.
Power supplies are used in various steps of semiconductor production and have to be able to keep pace with any changes as well as contribute to productivity with any changes themselves.
German company HÜTTINGER has a strong understanding of power supply needs and have introduced the high-frequency generator TruPlasma RF1003 they feel offers an innovative power supply that keeps abreast of the challenges for the compound semiconductor industry. The new device has been developed with a robust approach to providing energy efficiency and the company hopes to set new standards for such devices.
HÜTTINGER has also developed the ideal solution for cutting-edge trench-filling process using HIPIMS (high power impulse magnetron sputtering). DC generators from the TruPlasma Highpulse Series 4000 are
designed to reliably and accurately supply the necessary energy for these processes.
July 2010
www.compoundsemiconductor.net 15
In fabricating IC circuits, thin layers of materials are applied to a wafer’s surface and required structures are constructed. The layering and etching processes often use plasma sources due to high production qualities. To deposit amorphous silicon (a-Si), micro crystalline silicon (µc-Si), SiO2 and SiNx onto the wafer, PECVD (plasma- enhanced chemical vapor deposition) processes are used. HÜTTINGER developed the TruPlasma RF 1003 especially for this purpose. This power supply produces outputs ranging from 1 watt to 3000 watts at a frequency of 13.56 megahertz, in addition to PECVD, it also reliably supplies precise power for etching processes.
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