Page 20


www.us-tech.com


March, 2024


Intersurface Dynamics: Cutting-Edge


Chemical Solutions for Surface Morphologies I


By Michael Skinner, Editor


ntersurface Dynamics, a leading manufacturer of ap- plication-specific chemicals


and an AMTECH Group compa- ny, has been at the forefront of improving material surfaces and morphology advancements since 1985. With a comprehensive range of proven products and ex- pert knowledge IDI supports some of the world’s largest man- ufacturers in various industries, including semiconductor, semi- conductor material, precision op- tics, ophthalmic, ceramic, ad- vanced display, and flat glass. “These manufacturers rely on us to optimize their critical high- volume manufacturing process- es,” says Jon Wolk, Intersurface Dynamics’ general manager.


Automated Production The company manufactures


products using automated pro- duction lines. Products are for- mulated using two laboratories, a chemical research lab contain- ing the latest analytic equipment and a process simulation lab con- taining process equipment mir-


roring customer facilities. Using advanced manufacturing tech- niques in the ISO 9001-regis- tered facility combined with these labs ensures the most cur- rent effective products are deliv- ered to the customers’ critical processes consistently and with- out delay. Input from field engineering


drives product design, while con- tinuous research in chemistry, physics, and material science fu-


els product innovation. Wolk comments, “We prioritize prod- uct effectiveness in the context of worker safety and environmen- tal compatibility striking a bal- ance that allows us to address the needs and challenges of our customers downstream.” Intersurface Dynamics of-


fers three distinct product lines, each designed to address the spe- cific needs of different industries. The Tensor series products cater


to integrated circuit manufactur- ers, providing solutions for chemical mechanical polishing (CMP), CMP pad and wafer rins- ing, post-CMP cleaning and sin- gulation. As the industry looks to advance metal schemes to enable faster devices, IDI has a library of specialized chemistry to both oxidize and remove material for planar surfaces. The VECTOR series prod-


ucts, on the other hand, are specifically tailored for grinding, sawing, lapping, cleaning, etch- ing, and polishing base semicon- ductor materials such as silicon and SiC wafers. For manufactur- ers in the precision optics, tech- nical ceramics, and advanced display industries, Intersurface Dynamics provides the CHAL- LENGE series products, which assist in achieving optimum yields by addressing similar processes. The VECTOR Series prod-


ucts have been the standard for production of silicon wafers, the primary substrate for semicon-


Intersurface Dynamics prides itself on prompt, reliable service. Continued on next page


Page 1  |  Page 2  |  Page 3  |  Page 4  |  Page 5  |  Page 6  |  Page 7  |  Page 8  |  Page 9  |  Page 10  |  Page 11  |  Page 12  |  Page 13  |  Page 14  |  Page 15  |  Page 16  |  Page 17  |  Page 18  |  Page 19  |  Page 20  |  Page 21  |  Page 22  |  Page 23  |  Page 24  |  Page 25  |  Page 26  |  Page 27  |  Page 28  |  Page 29  |  Page 30  |  Page 31  |  Page 32  |  Page 33  |  Page 34  |  Page 35  |  Page 36  |  Page 37  |  Page 38  |  Page 39  |  Page 40  |  Page 41  |  Page 42  |  Page 43  |  Page 44  |  Page 45  |  Page 46  |  Page 47  |  Page 48  |  Page 49  |  Page 50  |  Page 51  |  Page 52  |  Page 53  |  Page 54  |  Page 55  |  Page 56  |  Page 57  |  Page 58  |  Page 59  |  Page 60  |  Page 61  |  Page 62  |  Page 63  |  Page 64  |  Page 65  |  Page 66  |  Page 67  |  Page 68  |  Page 69  |  Page 70  |  Page 71  |  Page 72  |  Page 73  |  Page 74  |  Page 75  |  Page 76  |  Page 77  |  Page 78  |  Page 79  |  Page 80  |  Page 81  |  Page 82  |  Page 83  |  Page 84  |  Page 85  |  Page 86  |  Page 87  |  Page 88