Yudu - Nanotimes May/June 2010

10-05/06 :: May/June 2010

nanotimes Companies

scent OLED Lighting Panel Manufacturing Facility.” Under the new program, Universal Display will demonstrate the scalability of its proprietary Uni- versalPHOLED™ technology and materials for the manufacture of white OLED lighting panels that meet commercial lighting targets. Moser Baer Tech- nologies, a U.S. subsidiary of Moser Baer India, will design and build the U.S.-based pilot facility during this program.

http://www.universaldisplay.com V

eeco Instruments Inc. (NASDAQ: VECO), announced that Epistar Corporation, head-

quartered in Taiwan, has recently qualified Veeco’s TurboDisc®

K465i™ gallium nitride (GaN) Metal Or-

ganic Chemical Vapor Deposition (MOCVD) System for high volume light emitting diode (LED) produc- tion. The company introduced further the NEXUS® TAMR Physical Vapor Deposition (PVD) System for next-generation Thermal Assisted Magnetic Recor- ding (TAMR), also known as Heat Assisted Magnetic Recording (HAMR). The new system and Veeco’s proprietary process deposits a critical optical struc- ture in the read-write head that conducts the heat source used in TAMR. Veeco also announced that a global hard disk drive manufacturer has placed an order for this PVD system to support its deployment of this key technology. http://www.epistar.com.tw/ http://www.veeco.com

istec Lithography Inc., a world leader in electron beam lithography, announced a major order

with the Pennsylvania State University, University Park, PA, USA, for one of Vistec’s EBPG5200 elec- tron beam lithography systems. The instrument will become part of the National Science Foundation‘s

National Nanotechnology Infrastructure Network to support advanced nanotechnology research across the nation.

The Vistec EBPG5200 will allow fabrication of a diverse set of devices supporting fundamental and applied research for emerging nanotechnology ap- plications. With the acquisition of the lithography sy- stem and its unique nanoscale patterning capabilities, the Penn State Nanofabrication Laboratory will have one of the most advanced electron beam lithography systems for nanotechnology research and develop- ment. Through the National Nanotechnology Infrastructure Network (NNIN), the EBPG5200 will also be available to other academic institutes, indus- tries and government entities desiring high perfor- mance electron beam lithography and nanotechnolo- gy fabrication services. The EBPG5200 system will be