VISTEC EBPG5200 help me to keep on track of my challenging research roadmap?*
Piet Kaars Engineering Manager EPBG Series
* Yes, absolutely! Lithography below 8nm, exposure capabiltity from small fragments to complete 200mm substrates, high position accuracy and perfect long term stability in combination with a user friendly operation gives you the fl exibility you need today and in the future. A team of well-experienced lithography engineers are continuously working on further improvement of the system to make it even more valuable for our customers.
Your Dedicated Performance Partner for Electron Beam Lithography
Vistec Electron Beam Lithography Group I www.vistec-semi.com