installed in the University‘s new Millennium Science Complex and will be a cornerstone for current and future Penn State nanotechnology research. The system is a result of an NSF Major Research Instru- mentation award under the American Recovery and Reinvestment Act of 2009. Additional funding comes from Penn State and the Commonwealth of Pennsyl- vania.
The Vistec EBPG5200 is the latest version of the highly successful EBPG5000plus electron beam litho- graphy system technology. The EBPG52000 system with both 50 and 100 keV accelerating voltages, 50 MHZ pattern generator and full 20 bit address technology has the demonstrated ability to routinely pattern to 6-8nm, address field sizes to 1mm, and ac- commodate varying substrates sizes from piece parts of a few millimeters to full patterning across a 200 millimeter diameter. The EBPG5200 electron optics and column design provides not only high resolution, but also delivers high beam currents resulting in very high throughput, high resolution patterning.
Further, the EBPG5200 system that will be installed at Penn State has been designed with a unique z-axis feature allowing it to accommodate thick or curved substrates and making it ideal for emerging nano- technology applications. Coupled with its extremely flexible Linux based software and associated GUI’s, it is ideal for multiuser, university applications. The various features of EBPG series have made it a leader for university, research institute and industry environ- ments where ease of use, high resolution, throughput and system reliability are required. “We are very ex- cited about our NSF Instrumentation award and the acquisition of the Vistec EBPG5200,” said Theresa S. Mayer, Professor of electrical engineering and Direc-
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tor of the Penn State Nanofabrication Facility. “The instrument is the perfect match for our demanding and unique research needs. It will provide us with a flexible, user friendly, state-of-the-art patterning capability to explore many new avenues of nano- technology research and development using electron beam lithography. We are very pleased to be partne- ring with Vistec and look forward to our continued interactions.” http://www.vistec-semi.com
ITec GmbH, worldwide leader in nano- analytical microscopy systems, announces
its further expansion into the Asian-Pacific markets with the opening of a new office in Singapore. In this step, WITec advances its strategy of being clo- ser to the market and strengthening its position in the Asian-Pacific region. The decision to launch the new operations in Singapore will accelerate WITec’s growth and reflects the philosophy of better serving the worldwide customer base. Located in the “Ger- man Centre Singapore”, the new office will provide valuable support to the numerous sales and service activities of the regional distributors. Under the lea- dership of Matthias Kress, WITec Director Sales Asia, the new Singapore office aims to further establish WITec high-resolution microscope systems in the scientific community of the region. http://www.witec.de