10-05/06 :: May/June 2010


nanotimes Companies


scent OLED Lighting Panel Manufacturing Facility.” Under the new program, Universal Display will demonstrate the scalability of its proprietary Uni- versalPHOLED™ technology and materials for the manufacture of white OLED lighting panels that meet commercial lighting targets. Moser Baer Tech- nologies, a U.S. subsidiary of Moser Baer India, will design and build the U.S.-based pilot facility during this program.


http://www.universaldisplay.com V


eeco Instruments Inc. (NASDAQ: VECO), announced that Epistar Corporation, head-


quartered in Taiwan, has recently qualified Veeco’s TurboDisc®


K465i™ gallium nitride (GaN) Metal Or-


ganic Chemical Vapor Deposition (MOCVD) System for high volume light emitting diode (LED) produc- tion. The company introduced further the NEXUS® TAMR Physical Vapor Deposition (PVD) System for next-generation Thermal Assisted Magnetic Recor- ding (TAMR), also known as Heat Assisted Magnetic Recording (HAMR). The new system and Veeco’s proprietary process deposits a critical optical struc- ture in the read-write head that conducts the heat source used in TAMR. Veeco also announced that a global hard disk drive manufacturer has placed an order for this PVD system to support its deployment of this key technology. http://www.epistar.com.tw/ http://www.veeco.com


V


istec Lithography Inc., a world leader in electron beam lithography, announced a major order


with the Pennsylvania State University, University Park, PA, USA, for one of Vistec’s EBPG5200 elec- tron beam lithography systems. The instrument will become part of the National Science Foundation‘s


© Vistec Semiconductor


39


National Nanotechnology Infrastructure Network to support advanced nanotechnology research across the nation.


The Vistec EBPG5200 will allow fabrication of a diverse set of devices supporting fundamental and applied research for emerging nanotechnology ap- plications. With the acquisition of the lithography sy- stem and its unique nanoscale patterning capabilities, the Penn State Nanofabrication Laboratory will have one of the most advanced electron beam lithography systems for nanotechnology research and develop- ment. Through the National Nanotechnology Infrastructure Network (NNIN), the EBPG5200 will also be available to other academic institutes, indus- tries and government entities desiring high perfor- mance electron beam lithography and nanotechnolo- gy fabrication services. The EBPG5200 system will be


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