Equipment and Materials ♦ news digest
About 49 percent of Aixtron SE’s share capital was represented at the shareholder meeting held at the Eurogress in Aachen, Germany.
The Supervisory and Executive Board speeches given during the meeting were broadcast live via the internet, and are now available as webcasts under (
www.aixtron.com/agm). The speaker notes and the slides to the presentation to Topic 1 of the agenda are also available for download from the website.
Nanotronics “Point and Shoot” technology ideal for CS defect characterisation
The flexible system images defects on 2” to 8” wafers and aims to eliminate a learning curve for users, whilst providing accurate and easy to interpret data.
Nanotronics Imaging introduced its nSPEC semiconductor analysis system at the CS Mantech show in Palm Springs, California.
The proprietary software and hardware underlying nSPEC enable rapid and detailed analysis of wafer defects and are particularly suited to compound semiconductor wafers.
while giving accurate and easy to interpret data.
Nanotronics Imaging has also appointed a new Vice President Ivan Eliashevich, who brings a level of expertise in the semiconductor industry that is unique. “I knew Ivan as a client, who helped me to understand wafer technology. He is honest, knowledgeable, and a powerful proponent for the customer and supplier. I feel lucky to have him as a part of our team”, says CEO and founder Matthew Putman.
Oxford wins multiple etch system order from GCS
GCS chose Oxford because its ICP etchers offer a combination of process capability, consistency, value and diversity to process a variety of compound semiconductor materials, including GaAs, InP and GaN to achieve the desired device performance.
Etch, deposition and growth systems manufacturer Oxford Instruments has received an order from Global Communication Semiconductors (GCS) for multiple PlasmaPro System100 ICP 180 etch systems.
Complete system automation with cassette-to- cassette loading of 2”-8” wafers is also available. Nanotronics uses “Point and Shoot” microscopy, and aims to eliminate a learning curve for users,
This will expand California based GCS’s foundry capabilities in dielectric and GaN etching and further increase the number of systems installed from Oxford Instruments.
“GCS chose Oxford Instruments because their ICP June 2011
www.compoundsemiconductor.net 197
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