JUST DUE’T
•
Hitachi Focused Ion and Electron Beam System
nanoDUE’T NB5000
The Hitachi nanoDUE’T NB5000 Focused Ion and The SEM column and detector design – unmatched
Electron Beam System enables high-throughput in the industry – allows high-resolution SEM
specimen preparation with high resolution imaging during and after FIB fabrication.
imaging, analysis and precision nanofabrication.
Innovations in sample loading, navigation and
Hitachi’s patented Micro-sampling (In-situ liftout)
Micro-sampling increase analysis efficiency.
technology provides smooth probe motion.
Precision end point detection with Mill & Monitor
Low Cs FIB optics (patent pending) delivers 50nA
mode (M&M) complete with a user friendly template
or more of beam current at 40kV in a 1µm spot
makes it a snap to reach your target step by step,
size. The high current enables unconventional
picture by picture
large-area milling, hard material fabrication and
multiple specimen preparation.
Legendary Hitachi reliability and performance
in one integrated system.
Slice thickness: 10µm
3D Pillar Observation
Mill and Monitor:
SEM Acquisition while
FIB Milling
Hitachi High Technologies America Nanotechnology Systems Division 5100 Franklin Drive Pleasanton, CA 94588 800.227.8877
www.hitachi-hta.com
Page 1 |
Page 2 |
Page 3 |
Page 4 |
Page 5 |
Page 6 |
Page 7 |
Page 8 |
Page 9 |
Page 10 |
Page 11 |
Page 12 |
Page 13 |
Page 14 |
Page 15 |
Page 16 |
Page 17 |
Page 18 |
Page 19 |
Page 20 |
Page 21 |
Page 22 |
Page 23 |
Page 24 |
Page 25 |
Page 26 |
Page 27 |
Page 28 |
Page 29 |
Page 30 |
Page 31 |
Page 32 |
Page 33 |
Page 34 |
Page 35 |
Page 36 |
Page 37 |
Page 38 |
Page 39 |
Page 40 |
Page 41 |
Page 42 |
Page 43 |
Page 44 |
Page 45 |
Page 46 |
Page 47 |
Page 48 |
Page 49 |
Page 50 |
Page 51 |
Page 52 |
Page 53 |
Page 54 |
Page 55 |
Page 56 |
Page 57 |
Page 58 |
Page 59 |
Page 60 |
Page 61 |
Page 62 |
Page 63 |
Page 64 |
Page 65 |
Page 66 |
Page 67 |
Page 68