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➤ the new technology will help them measure the movement of electrons with a higher resolution, so they can better understand materials. High harmonic generation through to silver


funnels are all heady stuff. The technology currently being investigated for lithography, while still extreme UV, is at slightly longer wavelengths of up to 30nm. Lithography depends on either laser-produced plasmas or discharge-produced plasma, where the plasma of choice is tin. In a laser-produced lithography process, a laser is fired into droplets of tin to create a tin-plasma. Ultimately, for lithography, professor Tallents


from the Univeristy of York expects systems with wavelengths of less than 13.5nm to be developed. He says: ‘They are talking about half the wavelength of 13.5nm as the next step, after the 13.5nm lithography, which of course isn’t in production yet, but 5.5 to 6.5nm would extend the technique to enable finer features to be produced in lithography.’ Instead of tin or any of the


other elements or compounds mentioned, terbium and gadolinium have been studied, because their electron structure is similar to that of tin. Work with gadolinium produced emissions in the 5.5nm to 10nm range. As for microchip production at the 5.5nm


next year. Leibinger adds: ‘The first machines are now installed. [Lithography technology manufacturer] ASML has publicised that. They have shipped, I think, six pilot systems to chip manufacturers and we now think that in 2012 the first production systems will go in.’ EUV development has taken longer than


expected. Companies such as Jenoptik got out of EUV altogether, selling their stakes in the technology. Leibinger does not understate the scale of the task. He says: ‘It’s an extremely tough project. This is a very early-stage technology [and] we’ve been involved in this development project for eight years now.’ Sources of EUV are expanding. For non lithography applications, alternatives to tin plasmas include methanol and liquid nitrogen. Here a pulsed infrared laser is focused into a jet


Researchers are queuing up to


take advantage of the possibilities that this developing technology offers


sales@phoenixphotonics.com www.phoenixphotonics.com


wavelength, Trumpf’s head of laser technology Dr Peter Leibinger is sanguine. Speaking to Electro Optics at the company’s headquarters, he said: ‘There could be [5.5nm], in ten years maybe. Let’s first get 13.5 working, and then we can talk about the next step’. Getting 13.5nm to work is part of Trumpf’s focus right now, as the start of chip production using this wavelength begins


of methanol or liquid nitrogen to create EUV sources at 3.37nm with methanol and 2.48nm with liquid nitrogen. Lasers employing high harmonic generation, free electron lasers, tin- plasma, methanol and liquid nitrogen plasmas, and now silver funnels of xenon gas, water windows, producing wavelengths between 5nm and 13.5nm – the toolkit is impressive. Researchers ranging from biologists to material scientists are queuing up to take advantage of the possibilities that this developing technology offers. l


www.electrooptics.com


stFC Central laser Facility XUV laser


Fiber Optic Components and Modules


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