Technology - Lithography
Optimizing beyond expectations
Photolithography advances are continuing to enable high volume manufacturing of sub-22nm node features using argon fluoride (ArF) light sources. With the use of source-mask optimization (SMO), pixellated illumination schemes and computational lithography, the use of 193nm light continues to be extended to finer geometries. The light source contribution includes higher power to enable higher throughput, improved optical performance stability for tighter critical-dimension uniformity (CDU) and reduction of service events to increase system uptime. Ted Cacouris, Ph.D discusses how Cymer has been actively pursuing such light source advances on its latest ArF immersion light source, the XLR 600ix.
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www.euroasiasemiconductor.com Issue IV 2011
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