11-01 :: December 2010 / January 2011
nanotimes
Companies Facts
Vistec‘s Multi Shaped Beam technology represents one of the most promising solutions to overcoming the throughput limitations in electron-beam lithogra- phy. By applying MSB techniques the substrate is ex- posed with an array of individually controlled shaped beams in parallel instead of a single shaped beam sequentially. The underlying technology continues to utilize the basic principle of shaped beams which significantly reduces the development risk and time. Proof of Lithography has already been successfully demonstrated.
“We will continue to pursue the development of MSB technology, since we have learned from many occasions that there is a strong market demand for a commercially available high throughput multi e-be- am writer. The combination with an air-bearing stage platform will enable Vistec to meet challenging future performance requirements,” stated Wolfgang Dorl, General Manager of Vistec Electron Beam GmbH. For this aspiring development Vistec has teamed up with uniquely qualified partners from research organisations and the industry. Vistec has already received a Purchase Order for an advanced variable shaped beam lithography tool equipped with an air- bearing stage platform.
Furthermore, Vistec Lithography Inc. has received an order from Turkey for one of its electron-beam lithography systems. The global supplier of advanced electron-beam lithography systems will deliver an EBPG5000plusES to the newly formed Nanotech- nology and Application Center (SUNAC) of the Sabanci University based in Istanbul. The Gaussian Beam system fulfils the challenging requirements of the institute which will collaborate in the field of nanotechnology research with other institutions.
Vistec’s EBPG5000plusES enables a rapid exposure with a 25MHz rate and a minimum feature size of less than 8nm. The EBPG5000plusES system is capa- ble to expose various substrate types including masks and dimensions up to 150mm size.
Vistec received further an order from the ETH Zurich (Swiss Federal Institute of Technology) for one of its Vistec EBPG5200 systems. The Vistec EBPG5200 will be installed in the new Nanotechnology Center, which is a unique, public private partnership bet- ween IBM Research, Zurich and ETH Zurich.
http://www.vistec-semi.com
University of Jerusalem, and Vaxan Steel Co., Ltd., a leading Korean company in the field of innovative printing, signed a licensing and research agreement for the development of silver nanoparticles and silver-coated copper nanoparticles for conductive inks. The novel conductive inks were invented by Professor Shlomo Magdassi, Dr. Alexander Kamyshny and Michael Grouchko from the Institute of Chemi- stry at the Hebrew University. According to the terms of the agreement, Yissum grants Vaxan a license to commercialize the technology exclusively in Asia, excluding Israel and former Soviet Union countries, and will receive in return research fees and royalties from future sales.
Y
Vaxan focuses on developing manufacturing system of solar cells, displays and nanomaterials, e-paper, OLEDs.
http://www.vaxan.co.kr
issum Research Development Company Ltd., the Technology Transfer Company of the Hebrew
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