Instrumental in change Leading plasma process innovation
Oxford Instruments Plasma Technology is turning smart science into world class products with its flexible systems for precise and repeatable etching, deposition and growth of micro and nano structures
Plasma Etch & Deposition Atomic Layer Deposition Ion Beam Etch & Deposition Nanoscale Growth Systems Hydride Vapour Phase Epitaxy
For more information, please contact Oxford Instruments Plasma Technology: Tel: +44 (0)1934 837 000 Email:
plasma@oxinst.com
www.oxford-instruments.com/plasma AH0711LTD_PlanarHD_178 x123:AGR_halfpage.qxd 27/07/2011 12:17 Page 1
Dissatisfied with the throughput limitations of your current air- bearing wafer processing platform? Aerotech's PlanarHD
PLASMA is the answer.
This high dynamic, high throughput air-bearing provides 2 m/s scan velocities and 5 g acceleration with 450 mm wafer scalability. Each element of the PlanarHD
is
designed for maximum dynamic performance.
• 5 g acceleration and 2 m/s scan velocity provide a 4X increase in throughput
• Dual encoder feedback on step axis minimizes turn-around time
• Integral water cooling allows higher rms acceleration and improved geometric performance
• Advanced control features like Iterative Learning Control dramatically improve dynamic performance
• Ultra-low latency Position Synchronized Output (PSO) triggers external events based on real-time position data
Dedicated to the Science of Motion
www.aerotech.com
Aerotech Ltd, Jupiter House, Calleva Park, Aldermaston, Berkshire RG7 8NN - UK Tel: +44 (0)118 940 9400 - Email:
sales@aerotech.co.uk
A e r o t e c h Wo r l d w i d e United States • Germany • Uni ted Kingdom • Japan • China
AH0711LTD_PlanarHD
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