11-02/03 :: February / March 2011
nanotimes
Companies Facts
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Within seconds, NanoFocus´ non-contact measurement systems deliver precise 3D data of technical surfaces in the micro and nanometer ranges. To always provide the best solutions to our customers, we internally design, develop and produce hardware and soft- ware for more than 15 years.
Now, NanoFocus goes inline too – same NanoFocus precision with over 1 million measure- ments per second to satisfy a broad range of industrial applications.
in field laboratories and hospitals. This microscope is available in 22 countries with a particularly high rate of tuberculosis infections at a preferential price.
Carl Zeiss introduced a new production tool aimed to improve registration and overlay of ad- vanced photomasks. The brand new system called RegC™ is based on ZEISS femtosecond-laser techno- logy. RegC™ enables to correct high-end photomasks for remaining registration er- rors after the pattern generati- on process. Current results give evidence of registration im- provements over 50%. RegC™ thereby helps to reduce the overlay error in wafer printing which is one of the most criti- cal items in advanced lithography.
“This application is targeted to customers who want to beat the lithography roadmaps for overlay and registration, in conjunction with double patterning or other advanced lithography schemes.” states Guy Ben-Zvi, Managing Director of Carl Zeiss SMS Ltd. in Karmiel, Israel. “The RegC™ system builds an ideal closed-loop application with the successful ZEISS PROVE™ registration metrology tool and is another milestone in the ZEISS strategy to support our custo- mers with solutions resulting in perfect photomasks. We developed this system after an extensive survey of our high-end customer base which had clearly pointed out the emerging need of the industry.”
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Carl Zeiss presented the new tool RegC™ on SPIE Advanced Lithograpy in San Jose, California, between February 27 and March 4, 2011.
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