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nanotimes
Companies Facts
growing wind power market. Our combined com- pany is expected to be serving China’s three largest wind turbine manufacturers – Sinovel, Goldwind and Dongfang – in various capacities. The Switch will also significantly strengthen AMSC’s presence in Western wind markets with customers such as GE and create a new channel to market for AMSC in addition to our Windtec™ licensees. In short, this combination will create a global wind powerhouse.” In conjunction with this announcement, AMSC is updating its guidance for fiscal year 2010 (ending March 31, 2011). The company expects that its revenues will be toward the lower end of its $430 million to $440 million forecast range. Due primarily to anticipated one-time costs related to the acquisiti- on, AMSC is reducing its net income guidance from a range of $48.0 million to $50.0 million, or $0.99 to $1.04 per diluted share, to a range of $44.0 million to $46.0 million, or $0.91 to $0.95 per diluted share.
The company’s non-GAAP net income guidance is being reduced from a range of $64.5 million to $66.5 million, or $1.33 to $1.38 per diluted share, to a range of $63.5 million to $65.5 million, or $1.31 to $1.35 per diluted share. Please refer to the financial table included below for a reconciliation of GAAP to non-GAAP guidance.
http://www.amsc.com
mance materials based on spider silk, is announcing the successful completion of a EUR5 million Series B financing round. AMSilk produces and processes SPIDERSILK, high performance biopolymers copied from the proteins of web-weaving spiders. SPIDER- SILK has unique properties such as mechanical
A
MSilk, a privately-held company specializing in the development and production of high perfor-
toughness, chemical resistance and biocompatibility – while being completely biodegradable. AMSilk is able to produce SPIDERSILK in large scale and pro- duce coatings, beads, films, nonwovens, and fibers used to improve existing or to develop completely new products.
http://www.amsilk.com/en
C
EA-Leti and ASELTA Nanographics, its newly incorporated startup, will jointly develop e-
beam proximity effects correction solutions for both mask writing and maskless lithography (ML2) applica- tions. This common lab is staffed with a joint team of CEA-Leti and ASELTA personnel. Part of this collabo- ration will be done inside the multi-partner IMAGI- NE program, which is designed to develop maskless lithography for IC manufacturing.
Launched in November 2009, ASELTA Nanogra- phics develops software that reduces production costs for chips at the 32nm node and beyond by improving fab-process precision, including cycle time and lithography-image quality.
“ASELTA is excited about funding a joint laboratory with CEA-Leti in order to get access to leading edge e-beam equipment and validate its work on e-beam proximity effects correction,” said Serdar Manakli, ASELTA CEO. “E-beam proximity effects have been under-estimated so far. Our experience has proven that with our unique expertise, we can provide our customers with dramatic productivity improvement and lifetime extension of current equipment. The fact that more and more partners are joining part- nership programs like IMAGINE is a validation of our vision.”
11-02/03 :: February / March 2011
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