Metrology
WOOPTIX INSTALLS FIRST PHEMET METROLOGY SYSTEM AT CEA-LETI
Likewise, NC-PartLocator has transformed Pentaxia’s part setup routine and removed many of the stressful decisions. “The contrast between before and now is extraordinary,” Lazar comments. “We can generate the alignment in a single operation and start machining almost immediately.” This faster setup procedure has reduced production time per set of parts by 50 per cent, from 40 hours to 20 hours. The removal of manual error, combined with NC-Checker’s machine performance assessment, has also enabled Pentaxia to eliminate concessions entirely.
W
While the technology was initially introduced as a ‘leap of faith’ to support a specific contract, its impact has extended far beyond the original requirement, influencing a broader machining strategy and fostering a more confident, controlled shopfloor culture. “All of the complex jobs go on the fondly named ‘MSP machine’ because that’s the safest place for them,” Lazar says. “The most complex parts now have the fewest errors – a total paradox compared to traditional manufacturing.”
As a result, the cultural shift across the shopfloor has been significant. Lazar comments,: “A complex project no longer has the fear factor and is seen as a positive challenge. The process is reliable and repeatable, and confidence across the shopfloor has soared.” Lucian concludes: “At the end of the day, it is the natural progression for CNC manufacturing. We used to machine parts by hand, then 5-axis CNC machines were created. This is the logical next step. People don’t need to be setting up parts by hand anymore when MSP can do it automatically”.
MSP
mspltd.com Instrumentation Monthly August 2026
ooptix has
announced the installation of its Phemet system at
CEA-Leti’s Grenoble technology research institute, marking a significant milestone in the company’s expansion into semiconductor metrology and process control. Installed in May, the system will support joint work on wafer-scale process signatures, nanotopography, and advanced packaging metrology in an industrial semiconductor cleanroom environment. The joint agreement was highlighted during CEA-Leti Innovation Days/LID World Summit, the institute’s flagship annual event that took place in June in Grenoble.
“This installation marks a major milestone for Wooptix and a necessary step in our roadmap toward high- volume semiconductor manufacturing applications,” says José Manuel Ramos, CEO, Wooptix. “Our collaboration with CEA-Leti will allow us to validate Phemet in a highly controlled semiconductor cleanroom environment and to build application evidence around real process-development challenges alongside some of the world’s leading players. The project strengthens our presence in Grenoble, a dynamic European semiconductor hub.” The installation is the first deployment of Wooptix’s Phemet production metrology tool. The collaboration will enable Wooptix to test and refine its
technology directly in product-relevant processes while exploring new use cases within one of Europe’s most sophisticated R&D facilities.
“CEA-Leti is excited to evaluate the capabilities of the first fully automated Phemet 300 mm platform—a significant milestone that will enable the deployment of a wide range of applications at industrial scale. Our collaboration with Wooptix opens new opportunities to tackle cutting- edge challenges in nanotopographic metrology,” says Viorel Balan, Collaboration Project Manager. “By leveraging the Phemet platform, we aim to deepen our understanding of the processes, support research initiatives within European Union projects, and accelerate the development of next-generation advanced packaging technologies.” Wooptix introduced its Phemet metrology system in November 2025. It provides ultrafast and extremely accurate wafer shape and geometry measurements with sub-nanometer resolution. Phemet addresses the growing demand for improved process control in high-volume manufacturing, especially as the industry continues to innovate with higher-performance, smaller and more complex devices with nanoscale feature sizes and novel integration approaches.
Wooptix
www.wooptix.com 47
Page 1 |
Page 2 |
Page 3 |
Page 4 |
Page 5 |
Page 6 |
Page 7 |
Page 8 |
Page 9 |
Page 10 |
Page 11 |
Page 12 |
Page 13 |
Page 14 |
Page 15 |
Page 16 |
Page 17 |
Page 18 |
Page 19 |
Page 20 |
Page 21 |
Page 22 |
Page 23 |
Page 24 |
Page 25 |
Page 26 |
Page 27 |
Page 28 |
Page 29 |
Page 30 |
Page 31 |
Page 32 |
Page 33 |
Page 34 |
Page 35 |
Page 36 |
Page 37 |
Page 38 |
Page 39 |
Page 40 |
Page 41 |
Page 42 |
Page 43 |
Page 44 |
Page 45 |
Page 46 |
Page 47 |
Page 48 |
Page 49 |
Page 50 |
Page 51 |
Page 52 |
Page 53 |
Page 54 |
Page 55 |
Page 56 |
Page 57 |
Page 58 |
Page 59 |
Page 60 |
Page 61 |
Page 62 |
Page 63 |
Page 64 |
Page 65 |
Page 66 |
Page 67 |
Page 68 |
Page 69 |
Page 70 |
Page 71 |
Page 72
