tool towards metrology for line-edge- roughness (LER) of the grating lines, and on the other hand to investigate alternative hardware implementations in view of possible improvements regarding sensitivity for profile metrology of diffraction gratings. “For
the LER-metrology, the current
hardware could be complemented with a new algorithm as a software option that performs the CD-metrology separately for two orthogonal polarizations of the light incident on the diffraction grating,” explains Wim Coene, leader of SRT4. “The main part of this work was a theoretical study which showed that the difference of the respective retrieved CD-values is a direct measure for the line- edge roughness of the grating. This hypothesis was very successfully confirmed with experimental data.”
approximately every two years). The progress in performance of products based on these advanced IC’s supports the economical growth in many areas such as health care, mobile devices, high speed communication. The entire project was designed as a
way to increase and share knowledge between disciplines and provide long- lasting
training to its members.
Researchers from all over Europe have been selected to work on the training programme which offers them an innovative, structured course within their chosen field. The members will be able to continue their research following the conclusion of the SPAM project last year and be well equipped with the skills needed to meet market
Project Information AT A GLANCE
Project Title: S.P.A.M.: Supra-disciplinary approach to research and training in surface Physics for Advanced Manufacturing
Project Objective: The project objectives are to foster the development of next generation researchers, to identify and develop crucial knowledge in the field of surface physics required for optical lithography technology which will enable the manufacturing of smaller semi-conductors by printing features under 32 nm with extreme positional accuracy (< 4 nm).
Project Duration and Timing: 4 years, October 2008 to September 2012
Project Funding: European Commission (FP7) Marie Curie Action. Funding: Euro 4,300,696.82
Project Partners: ASML Netherlands BV, adixen Vacuum Products SAS, Carl Zeiss SMT AG, Interuniversitair Micro-Electronica Centrum VZW, IMEL NCSR Demokritos, Universität Stuttgart, LaVision GmbH, Organisatie voor Toegepast Natuur-wetenschappelijk Onderzoek, Technische Universiteit Delft, Wageningen Universiteit, Universität Würzburg, Universiteit Twente
“For the second part of this SRT, a new
hardware concept has been devised based on sequential acquisition of diffraction patterns for different positions of a focused laser beam along the unit cell of the diffraction grating. Such a scan in lateral position enables us to retrieve the phase of the wave front in addition to the amplitude information that is measured directly. A substantial improvement in precision for profile reconstruction could be achieved in this way. The new method has also revealed a strong sensitivity for lateral position information,
like in the case of a typical
overlay error.” Timely availability of researchers and results supporting
the technology for
lithography and metrology are a prerequisite for realization of the leading International Technology Roadmap for Semiconductors that ensures advancements in performance of IC’s and supports the continuation of Moore’s law (describing that the number of transistors that can be placed inexpensively on an integrated circuit doubles
www.projectsmagazine.eu.com
demands and application development for the near future. This is a focal point to the project. “Young researchers have gained
further research training which helps them to develop their research skills and supports them in their research career”
said Project Coordinator
Gerold Alberga. “Universities, institutes and industry
as well as the researchers involved in the project may benefit
in the future
from the network that has been created during the project. Having better trained researchers in Europe will enhance the knowledge based economy of Europe” he added. The researchers that make up the SRT’s and Alberga are confident
that
the training network will prove to be a success.
Individual research subjects
will be followed up after the project has come to its end, which bodes well for some researchers who may be hoping to achieve a personal accolade as well.
★ 95 Main Contact:
Dr. Gerold E. Alberga Dr. Alberga works for ASML and has extensive experience in managing large international projects, viz. the FP6 project more Moore on EUV lithography, the MEDEA+ EAGLE and CATRENE EXEPT projects on technology for the EUV lithography tools as well as the ENIAC JU LENS project on lithographic enhancements towards nanoscale.
Contact: Tel: +31 40 2685979 Email:
gerold.alberga@
asml.com Web:
www.asml.com
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