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nanotimes EU-Projects
JRP Summary Report for Project IND 07 Thin Films Metrology for the Manufacturing of Thin Films
The aim of this project is to establish a pan-European metrology capability with the goal of providing validated and/or traceable metrology for: thin film materials properties; composition and structure; and for controlling large area homogeneity and consisten- cy of properties. This JRP will develop the necessary metrology to control consistency of thin film pro- cessing and improve production quality in order to reduce costs and time-to-market for new products.
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Project webpage: http://projects.npl.co.uk/optoelectronic_films/
12-01 :: January 2012
they assessed environmental, safety and health (ESH) issues for all materials and processes.
The NAPA consortium successfully created a library of the three nanopatterning processes evaluated and developed simulation tools for process optimi- sation. The library and simulation tools provided low-cost, scalable alternatives to traditional deep UV technology with widespread applicability to informa- tion and communication technologies (ICT), pharma- ceuticals, biotechnologies, health and medicine.
The consortium tested the materials, equipment, processes and techniques via several demons- trators including an optical encoder, a distributed feedback laser (DBF) and a microfluid device.
In summary, the NAPA consortium significantly advanced the state of the art for nanopatterning by providing low-cost, high throughput alternatives to deep UV technology. The library and simulation tools should provide a significant boost to the manufacture of nanoscale ‘machines’, enhancing European com- petitiveness in a very competitive global market.
Low-cost Machines on an Atomic Scale
The “Emerging nanopatterning methods” (NAPA) project was designed to pull together over 80% of the existing European knowledge related to nano- lithography with the goal of creating a library of nanopatterning processes to spur radical innovations in the field. The researchers focused on nanoimprint lithography, soft lithography and self-assembly and MEMS-based nanopatterning including materials, tools and simulation of these methods. In addition,
Contact: Jouni Ahopelto (Prof.), VTT VALTION TEKNIL- LINEN TUTKIMUSKESKUS, Espoo, Finland, Phone: +35-8456-6644, Fax: +35-8945-67012: http://www.micronova.fi