Ultratech’s net sales for the year ended Decem- ber 31, 2011 were $212.3 million, as compared to $140.6 million for fiscal 2010. Ultratech posted net income for the year ended December 31, 2011 of $39.2 million, or $1.47 (diluted), as compared to net income of $16.8 million or $0.67 per share (diluted) in fiscal 2010.
eeco Instruments‘ (NASDAQ: VECO) first quarter 2012 revenue is currently forecasted to
be between $115 million and $140 million. Earnings per share are currently forecasted to be between $0.04 to $0.25 on a GAAP basis, and $0.13 to $0.34 on a non-GAAP basis. Please refer to the attached financial table for more details.
John R. Peeler, Veeco’s CEO, commented, “We don’t see signs of near-term improvement in the LED environment and the current overcapacity situation could mean that MOCVD orders remain at these de- pressed levels for multiple quarters. In Data Storage, while overall market conditions are healthy, the con- tinued consolidation of our customer base will likely mean that order patterns will fluctuate from quarter to quarter.”
“While consumer electronics has been the dominant end market for LED technology over the past decade, and for which most MOCVD capacity was installed, these applications are expected to reach saturation in the next few years,” added Mr. Peeler. “Conversely, the LED general lighting market is in its infancy. We believe that after a transition year in 2012, de- mand for MOCVD tools will reaccelerate, driving
demand for thousands of additional next-generation reactors to make lower-cost, higher efficiency, brigh- ter LEDs for lighting applications. While estimates vary, LEDs are expected to represent more than 25% of the global lighting market by 2015 and the majo- rity of the market by 2020, a dramatic increase from today’s penetration of less than 5%.”
istec Lithography announced that Wuhan Natio- nal Laboratory for Optoelectronics (WNLO) at
Huazhong University of Science and Technology (HUST) in Wuhan, China, signed off its electron- beam lithography system Vistec EBPG5000pES. The WNLO, a national lab in the field of optoelectronics, HUST, a national key university in China, and Vistec Lithography, a leading supplier of electron-beam lithography systems, consider that event as a major milestone in their strategic partnership.
The Vistec EBPG5000pES is a high-end lithography tool based on reliable and well-proven system archi- tecture. With its flexible electron-optical column and high brightness TFE source, allowing 50 and 100kV operation, the system provides a spot size down to <2.2nm, thus enabling nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.
The Vistec EBPG5000pES electron-beam lithography system will enable WNLO to further strengthen its leading position in photonics and optoelectronics research and development. “The EBPG5000pES faci-
12-01 :: January 2012