Equipment and Materials ♦ news digest
temperature reactor upgrade for the Veeco MOCVD D-series Legacy System platform. The single two or three inch wafer, vertical quartz tube reactor upgrade will be fitted to a D180 system at the Korean Photonics Technology Institute (Kopti) in Gwangju, Seoul, South Korea.
According to the company, the High Temperature Radio-Frequency (HT-RF) reactor upgrade provides an economical high temperature growth capability to researchers seeking high quality aluminum nitride (AlN) epitaxial films, which are grown at process temperatures above 1400degC. Additionally, the HT-RF reactor excels at growth of all nitride based materials and is also suitable for silicon carbide.
Ross Miller, director of Agnitron technology development commented: “Ultra-low gas flows of the HT-RF reactor translate to hydride gas consumption 15 percent that of a D180 reactor making this a very capable yet economical choice for researchers.” Miller added that Atomic Layer Deposition style switching manifolds are available as an option for supporting Migration Enhanced Epitaxy growth techniques.
Currently the HT-RF reactor is offered as a standalone upgrade for the Veeco Legacy D125 and D180 Nitride MOCVD platforms as well as in the form of an Agnitron original design complete MOCVD system known as Agilis. The Agilis system provides all the process capabilities of the HT- RF reactor but in a compact cabinet with all new electronics and digital hardware communication protocols.
An identical HT-RF reactor upgrade is currently in operation at Agnitron’s facility for growth of AlN as part of the power electronics research program funded by the US Department of Energy.
CyberOptics extends APS line to GaAs, LED and 150mm fabs
Airborne particle sensor technology now available in multiple form factors
To meet demand for airborne particle measurement in GaAs, LED and 150mm semiconductor fabs, CyberOptics Corporation has
announced an extension to its WaferSense Airborne Particle Sensor (APS) line this week at SEMICON West, San Francisco.
With APS technology, equipment engineers can wirelessly monitor, identify and troubleshoot airborne particles in real-time within semiconductor process equipment and automated material handling systems. According to the company, customers have experienced up to 88 percent time savings, up to 95 percent reduction in costs, and up to 20 times the throughput with half the manpower resource requirements using the WaferSense APS relative to legacy surface scan wafer methods.
CyberOptics’ WaferSense measurement portfolio including the Auto Leveling System (ALS), the Auto Gapping System (AGS), the Auto Vibration System (AVS), the Auto Teaching System (ATS) and the Airborne Particle Sensor (APS) are available now in 150mm, 200mm, 300mm and 450mm wafer sizes.
Veeco Expands Compound Semiconductor R&D Portfolio with Agnitron Technology
Partnership allows universities and institutions to obtain low cost MOCVD systems for materials R&D applications
Veeco Instruments has formed a strategic partnership with Agnitron Technology, a focused compound semiconductor research and development company specialising in the refurbishment and upgrade of Veeco legacy MOCVD equipment.
The partnership will allow universities and institutions to obtain low cost, reliable MOCVD systems for materials research and development applications. Additionally, Veeco R&D MOCVD system users will be able to upgrade to Agnitron’s innovative Imperium software platform and have access to Agnitron’s technical support team.
“Veeco’s technology has served the compound semiconductor R&D and mass production markets for decades,” said William J Miller, executive VP of Veeco process equipment. “We are taking the next step to expand our R&D reach with Agnitron’s combined MOCVD refurbishment capabilities
Issue VI 2014
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