Environment on Demand Redefining Boundaries with the Hitachi AFM5300E Environmental-Control Atomic Force Microscope


Analysis under High-Vacuum Conditions


• Elimination of water layer and undesired oxidation at the sample interface • Exceptional accuracy, sensitivity, and resolution for optimized electromagnetic property measurements


Complete Environmental Control


• Imaging in air, liquid, and vacuum • Superior temperature regulation (-120 to 800 °C) • Humidity and gas injection control • Correlative AFM-SEM-IM in vacuo for environmentally sensitive materials


Innovative 2D Dopant Profiling Technology


• Hitachi-proprietary Scanning Nonlinear Dielectric Microscopy (SNDM) mode


• Ultra-high sensitivity for detecting low carrier densities


• High-resolution characterization for semiconductor devices


Visit Hitachi at 2017 MRS Spring April 18-19, 2017 | Phoenix, AZ


Think Outside the Lab Hitachi High Technologies America, Inc. www.hitachi-hightech.com/us 800-253-3053 Copyright © 2017 Hitachi High Technologies America, Inc. All rights reserved.


Page 1  |  Page 2  |  Page 3  |  Page 4  |  Page 5  |  Page 6  |  Page 7  |  Page 8  |  Page 9  |  Page 10  |  Page 11  |  Page 12  |  Page 13  |  Page 14  |  Page 15  |  Page 16  |  Page 17  |  Page 18  |  Page 19  |  Page 20  |  Page 21  |  Page 22  |  Page 23  |  Page 24  |  Page 25  |  Page 26  |  Page 27  |  Page 28  |  Page 29  |  Page 30  |  Page 31  |  Page 32  |  Page 33  |  Page 34  |  Page 35  |  Page 36  |  Page 37  |  Page 38  |  Page 39  |  Page 40  |  Page 41  |  Page 42  |  Page 43  |  Page 44  |  Page 45  |  Page 46  |  Page 47  |  Page 48  |  Page 49  |  Page 50  |  Page 51  |  Page 52  |  Page 53  |  Page 54  |  Page 55  |  Page 56  |  Page 57  |  Page 58  |  Page 59  |  Page 60  |  Page 61  |  Page 62  |  Page 63  |  Page 64  |  Page 65  |  Page 66  |  Page 67  |  Page 68  |  Page 69  |  Page 70  |  Page 71  |  Page 72  |  Page 73  |  Page 74  |  Page 75  |  Page 76