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nanotimes

Companies Facts

Furthermore Veeco announced that Johannes Seg- ner, Ph.D., recently joined the Company as Chief Technology Officer of Veeco’s Solar Equipment business. In related news, Veeco will host a Solar Technical Seminar on September 6 at EU-PVSEC in Valencia, Spain, and will exhibit its CIGS solar manufacturing equipment from September 6-9 at the tradeshow. Dr. Segner will be a featured speaker at the seminar, presenting “Designing a Best-of-Breed CIGS Thermal Deposition Factory, Lessons Learned & Future Considerations.” http://www.veeco.com

T

he International Iberian Nanotechnology Laboratory (INL) in Braga, Portugal has placed

an order for Vistec’s electron-beam lithography system EBPG5200. The Portuguese Laboratory is the first fully international research organization in Euro- pe in the field of nanoscience and nanotechnology. Vistec Lithography is a leading supplier of advanced electron-beam lithography systems.

The Vistec EBPG5200 is the latest version of the highly successive and field-proven EBPG electron- beam lithography tool series. The EBPG5200 system can be operated with both 50 and 100kV accelera- ting voltage and is equipped with a 50MHz pattern generator and full 20bit address technology. Thanks to further enhancements in resolution, noise reduc- tion and beam stability, the Vistec EBPG5200 is set to generate structures to less than 8nm on varying substrates sizes from piece parts of a few millimetres to full patterning across a 200mm diameter. Howe- ver, what makes Vistec’s electron beam lithography of superior standards so unique and actually possible, is the perfect match of the various system compon- ents such as the electron-optical column, the hard-

ware platform, the data processor and the exposure engine working together in a flexible and user friend- ly system. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse “multi user environments”.

The INL, which was established by Portugal and Spain some years ago, has now moved into the equipping phase of its new research facility, where the lithography equipment will play an important role. With the Vistec EBPG5200 series and its unique and flexible nanoscale patterning capabilities, the INL has acquired one of the most advanced electron- beam lithography systems for nanotechnology re- search and development. Furthermore, this will be the first installation of an EBPG5200 system at the Iberian Peninsula.

Commenting on the announcement, Rainer Schmid, General Manager at Vistec Lithography, Inc. noted: “At Vistec, we believe that it is essential to align with leading research organizations in the encouraging field of nanoscience and nanotechnology. That’s why we feel honored by INL’s choice to decide in favor of an EBPG5200.”

Furthermore, German AMO GmbH, a research ser- vice provider for nanotechnology located in Aachen (Germany), has placed an order for Vistec’s elec- tron-beam lithography system EBPG5200. Beside research & development capacity AMO is able to offer the entire infrastructure required for nanotech- nology, in which electron-beam lithography plays a decisive role. With the new Vistec EBPG5200 a highly flexible and reliable patterning system will be available for nanofabrication services.

10-09 :: September 2010