als, LLC („DuPont Air Products NanoMaterials“). The litigation began when DuPont Air Products NanoMaterials filed an action seeking to invalidate certain Cabot Microelectronics‘ patents and for a declaration of non-infringement of them in Decem- ber, 2006. It involves DuPont Air Products NanoMa- terials‘ manufacture and marketing of certain CMP slurries, including those for polishing tungsten, that the company believes infringe four patents owned by Cabot Microelectronics, which are fundamental patents in the field of CMP. All of Cabot Microelec- tronics‘ patents at issue in the case were found valid. However, the jury found that DuPont Air Products NanoMaterials‘ products at issue do not infringe the asserted claims of these patents. “We are pleased that the validity of all of our CMP patents at issue in this case, which are core patents for tungsten and other CMP polishing applications, has been upheld. However, we are disappointed with the jury‘s verdict regarding infringement, and are currently reviewing our legal options, including an appeal of the verdict and moving for judgment as a matter of law,” said H. Carol Bernstein, Cabot Mi- croelectronics‘ Vice President, Secretary and General Counsel. “We remain committed to the enforcement of our intellectual property and protection of our significant investment in patent-protected research and development.” http://www.cabotcmp.com
abot Corporation (NYSE: CBT) announced the acquisition of Oxonica Materials Inc. (OMI),
a wholly owned subsidiary of Oxonica plc. The purchase will complement Cabot‘s existing Security Business and expands Cabot‘s portfolio of security technologies. OMI is a leading developer of Surface Enhanced Raman Scattering (SERS) materials and
detection methods. These SERS materials provide a unique signal that can be detected using specialized readers and therefore provide highly counterfeit-re- sistant security solutions for a broad range of appli- cations including brand security, fuel markers, tax stamps and identification. Cabot Corporation‘s Secu- rity Business is a leading supplier of covert taggants for many high security applications. http://www.cabot-corp.com
arl Zeiss announced that Emile James (Jim) Pouquette, a former FEI Executive, has joined
Carl Zeiss SMT North America as senior vice presi- dent sales. Furthermore, SEMATECH and Carl Zeiss announced their agreement to design and develop the industry’s first-ever actinic aerial image me- trology system (AIMS™) for defect review of EUV photomasks. The AIMS™ EUV platform represents a critical tool for the development and manufacturing of defect-free extreme ultraviolet lithography (EUVL) masks targeted at the 22nm technology node and beyond. A first production-worthy version of the platform is scheduled for early 2014, in line with the expected introduction of EUV lithography into high- volume manufacturing by 2015.
In collaboration with SEMATECH’s EUVL Mask Infra- structure (EMI) consortium, Carl Zeiss will investigate a concept and feasibility plan for a tool that emulates the aerial image formed by a EUV lithography scan- ner supporting the 22nm half-pitch (HP) node requi- rements with extendibility to the 16nm HP node.
“Major industry transitions such as the introduction of EUV lithography require collaborative innova- tions that involve coordination across the supply chain,” said Dan Armbrust, president and CEO of
10-07/08 :: July/August 2010